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Waste gas washing treatment method and device in polycrystalline silicon industry

A water washing treatment, polysilicon technology, applied in separation methods, chemical instruments and methods, dispersed particle separation, etc., can solve the problems of difficult removal of silicon dioxide solids, environmental pollution, and difficulty in sewage treatment, reducing the escape of hydrogen chloride and solving the danger. and hazard, the effect of easy removal

Active Publication Date: 2015-06-03
BEIJING HANGHUA ENERGY SAVING ENVIRONMENTAL PROTECTION TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although the industrial water washing method has a high hydrolysis efficiency for chlorosilanes, a large amount of hydrogen chloride and silica solids after hydrolysis of chlorosilanes
Part of the hydrogen chloride will escape from the water into the atmosphere while being dissolved in industrial water, causing pollution to the environment; and the industrial wastewater formed after the industrial water absorbs hydrogen chloride is acidic, which causes great difficulties for subsequent sewage treatment, resulting in Silica solids are more difficult to remove from the system

Method used

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  • Waste gas washing treatment method and device in polycrystalline silicon industry

Examples

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Effect test

Embodiment 1

[0027] like figure 1 As shown, a method and device for washing waste gas in the polysilicon industry according to the present invention includes a waste gas buffer tank 1, a chlorosilane waste gas supply pipeline connected to the inlet of the waste gas buffer tank 1, and an outlet of the waste gas buffer tank 1 Connected normal exhaust gas spraying system, accident exhaust gas spraying system and emergency water washing system;

[0028] The normal exhaust gas spraying system includes normal exhaust gas spraying tower one 2 and normal exhaust gas spraying tower two 6, siphon tank one 8 and siphon tank two 15, normal exhaust gas spray circulation pump one 7 and normal exhaust gas spray tower circulation Pump two 16, lye pool one 9 and lye pool two 14; Wherein, the outlet of waste gas buffer tank 1 links to each other with the entrance of normal waste gas spray forest tower one 2, and the outlet of normal waste gas spray forest tower one 2 is connected with lye pool one The inle...

Embodiment 2

[0038] A method for washing waste gas from the polysilicon industry, comprising the following steps:

[0039] (a) The waste gas containing chlorosilane is transported to the waste gas buffer tank 1 through the waste gas supply pipeline containing chlorosilane, and then the waste gas is transported to the normal waste gas spraying tower 1 through the waste gas supply pipeline, and the waste gas runs in the tower from bottom to top Deposit 10~30% lye in the lye pool-9, and lye is sent to the top of the normal waste gas spray forest tower-2 tower by the normal exhaust gas spraying circulation pump-7 through the siphon tank-8 as spray liquid, sprays The liquid is in countercurrent contact with the waste gas from top to bottom, and the treated gas is discharged into the atmosphere through the water-sealed tank 4 on the top of the normal waste gas spraying tower-2;

[0040] The chlorosilane waste gas is transported to the waste gas buffer tank 1 through the chlorosilane waste gas su...

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Abstract

The invention provides a chlorosilane-containing waste gas washing treatment method and device in a polycrystalline silicon production process. The device comprises a waste gas buffer tank, a chlorosilane-containing waste gas supply pipeline connected with an inlet of the waste gas buffer tank, and a normal waste gas spraying system, an accidental waste system spraying system and an emergency washing system which are connected with an outlet of the waste gas buffer tank. The chlorosilane-containing waste gas is fed into a spray tower and is washed by spraying 10-30 percent of sodium hydroxide. The gas generated after spraying is discharged into atmosphere through a water-sealed tank. According to the method, the problem that hydrogen chloride escapes is effectively solved, the problem that the pipeline is blocked by silicon dioxide generated in the traditional washing process is solved, and harmlessness of environmental protection is realized. According to the device, the chlorosilane waste gas can be effectively and harmlessly treated, escape of hydrogen chloride can be effectively reduced, and sodium silicate generated in the reaction is relatively convenient to remove.

Description

technical field [0001] The invention relates to a water washing method for pollution-free treatment of chlorosilane waste gas produced in the polysilicon production process, and a water washing treatment device for the chlorinated silane waste gas produced in the polysilicon production process. Background technique [0002] The waste gas produced in the production process of the polysilicon industry contains a large amount of chlorosilane. In order to effectively treat the waste gas and make the tail gas discharge up to the standard, the traditional washing process is mainly used in China at present, that is, the flue gas is washed with industrial water and the waste gas is hydrolyzed. Chlorosilanes in. Although the industrial water washing method has a high hydrolysis efficiency for chlorosilanes, a large amount of hydrogen chloride and silicon dioxide solids are produced after hydrolysis of chlorosilanes. Part of the hydrogen chloride will escape from the water into the a...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B01D53/78B01D53/68
Inventor 李鹏飞张杰王为伟罗剑蒋巍李玉峰李双成郑全军胡佳肖伸亮
Owner BEIJING HANGHUA ENERGY SAVING ENVIRONMENTAL PROTECTION TECH CO LTD
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