A radiation dose detector with MOS structure and its preparation method
A MOS structure and radiation dose technology, applied in the field of electromagnetic detection technology, can solve problems such as high voltage, high temperature, and low current, and achieve the effect of increasing the measurement current and improving the sensitivity of the device
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[0036] Below in conjunction with accompanying drawing, the present invention is described in further detail by embodiment:
[0037] Such as figure 1 , the radiation dose detector with MOS structure prepared in this embodiment is divided into four material layers, the uppermost layer is the top electrode I, followed by the composite silicon dioxide layer II, the silicon substrate III, and the bottom layer is the bottom electrode IV . Composite silicon dioxide layer II is further divided into thermal oxide layer 1 and deposition layer 2.
[0038] The radiation dose detector of the above-mentioned MOS structure is prepared according to the following method:
[0039] 1) Take a single crystal silicon wafer (double-thrown silicon wafer, 400 μm, N-type doping, 100 crystal orientation) as the silicon substrate III, and perform photolithography and etching on the silicon substrate III to form a silicon column structure, that is, patterning Silicon Substrate III.
[0040] The etchin...
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