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Plated piece and preparation method thereof

A technology for coating parts and metal substrates, which is applied in the field of coating parts with relatively high hardness film layers and its preparation, and can solve problems such as easy oxidation

Active Publication Date: 2014-02-12
FIH PRECISION ELECTRONICS LANG FANG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the TiN film layer is prone to oxidation when it is as high as 400-500 °C
At present, the competition of electronic products is becoming increasingly fierce. In addition to requiring decorative features, the requirements for the hardness and wear resistance of the film layer are also getting higher and higher. Therefore, a single TiN film layer is difficult to meet the above requirements.

Method used

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  • Plated piece and preparation method thereof

Examples

Experimental program
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Effect test

preparation example Construction

[0022] The preparation method of the above-mentioned coated part 10 mainly includes depositing a TiSiN layer 13 on the metal base 11 and depositing a TiN layer 14 on the TiSiN layer 13 by magnetron sputtering.

[0023] Depositing this TiSiN layer 13 is under sputtering conditions, with titanium as the target material, with silane (SiH 4 ) and nitrogen (N 2 ) is the reactive gas, and the target material is sputtered and deposited on the surface of the metal substrate 11 by applying power to the target to form the TiSiN layer 13 . During the sputtering process, the flow rate of the silane gas gradually decreases from an initial value to 0 sccm (standard state milliliter / minute), and the initial value can be 40-30 sccm; the flow rate of the nitrogen gas gradually increases from 0-10 sccm to A maximum value, which may be 100-90 sccm.

[0024] The TiN layer 14 is deposited under sputtering conditions, with titanium as the target and nitrogen as the reactive gas, applying power to...

Embodiment 1

[0030] 1. Ultrasonic cleaning

[0031] Put the metal substrate 11 made of 304 stainless steel into an ethanol solution for ultrasonic cleaning to remove impurities and oil stains on the surface of the metal substrate 11 , and dry it for later use after cleaning.

[0032] 2. Coating

[0033] Magnetron sputtering equipment (produced by Shenzhen Nanfang Innovation Vacuum Technology Co., Ltd., model SM-1100H) is used. The magnetron sputtering equipment includes a vacuum chamber, a turntable, a magnetron target and a bias power supply. The magnetron target is a pair target structure, including two pairs of titanium targets, and a certain distance is formed between the two targets of each pair of titanium targets. The metal base 11 is fixed on the turntable, and when the turntable rotates, the metal base 11 is driven to pass between each pair of titanium targets.

[0034] Target washing: adjust the absolute pressure in the vacuum chamber to 6.0×10 -3 Pa, heat the vacuum chamber ...

Embodiment 2

[0041] 1. Ultrasonic cleaning

[0042]Put the metal substrate 11 made of 304 stainless steel into an ethanol solution for ultrasonic cleaning to remove impurities and oil stains on the surface of the metal substrate 11 , and dry it for later use after cleaning.

[0043] 2. Coating

[0044] Magnetron sputtering equipment (produced by Shenzhen Nanfang Innovation Vacuum Technology Co., Ltd., model SM-1100H) is used. The magnetron sputtering equipment includes a vacuum chamber, a turntable, a magnetron target and a bias power supply. The magnetron target is a pair target structure, including two pairs of titanium targets, and a certain distance is formed between the two targets of each pair of titanium targets. The metal base 11 is fixed on the turntable, and when the turntable rotates, the metal base 11 is driven to pass between each pair of titanium targets.

[0045] Target washing: adjust the absolute pressure in the vacuum chamber to 5.0×10 -3 Pa, heat the vacuum chamber s...

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Abstract

A coated article includes a metal substrate, a TiSiN layer formed on the metal substrate, and a TiN layer formed on the TiSiN layer. The TiSiN layer consists essentially of elemental Ti, elemental Si, and elemental N in non-homogenous deposition. The elemental Si within the TiSiN layer has a mass percentage gradually decreasing from the bottom of the TiSiN layer near the substrate to the top of the TiSiN layer away from the substrate. The elemental N has a mass percentage gradually increasing from the bottom of the TiSiN layer near the substrate to the top of the TiSiN layer away from the substrate. The TiN layer consists essentially of elemental Ti and elemental N. A method for making the coated article is also described.

Description

technical field [0001] The invention relates to a coating piece and a preparation method thereof, in particular to a coating piece with a relatively high hardness film layer and a preparation method thereof. Background technique [0002] TiN film layer has high hardness and good wear resistance, and is widely used in functional coatings such as knives, tools and molds; at the same time, because the TiN film layer is golden yellow, it is also widely used in the decoration of electronics, home appliances, watch cases and other products Sexual coating. However, the TiN film layer is prone to oxidation when it is as high as 400-500 °C. At present, the competition of electronic products is becoming increasingly fierce. In addition to requiring decorative features, the requirements for the hardness and wear resistance of the film layer are also getting higher and higher. Therefore, a single TiN film layer is difficult to meet the above requirements. Contents of the invention ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/06C23C14/35B32B9/00
CPCC23C14/0057C23C14/0084C23C14/025C23C14/027C23C14/0641Y10T428/265
Inventor 曹达华
Owner FIH PRECISION ELECTRONICS LANG FANG CO LTD
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