High-power and low-divergence semiconductor terahertz vertical surface-emitting laser
A technology of vertical surface emission and low divergence angle, which is applied in the direction of semiconductor lasers, lasers, laser components, etc., can solve the problems of asymmetric far-field divergence angle of size, unfavorable large-scale production of devices, complex structure and process production, etc., to achieve strong Experimental operability, improvement of far-field divergence angle, and effect of increasing surface emission output power
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[0020] see figure 1 and figure 2 As shown, the present invention provides a semiconductor terahertz vertical surface-emitting laser 10 with high power and low divergence angle, including:
[0021] A highly doped receiving substrate 1, the highly doped receiving substrate 1 is an n-type doped GaAs substrate with a doping concentration of 1×10 18 -2×10 18 cm -3 , the substrate is used for metal thermal bonding with the epitaxial wafer;
[0022] The lower metal waveguide light confinement layer 2 is formed by metal thermal bonding and is located on the receiving substrate 1. The material of the lower metal waveguide light confinement layer 2 is In—Au, which It is prepared by double-sided metal waveguide In / Au thermal bonding process;
[0023] The lower contact layer 3 is located on the lower metal waveguide light confinement layer 2, the lower contact layer 3 is n-type doped GaAs grown by MBE method, and the doping concentration is 2×10 18 cm -3 , with a thickness of 0.2 ...
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