The invention provides a terahertz
quantum level cascaded
laser with integration of an absorption
waveguide and a fabrication method of the terahertz
quantum level cascaded
laser. The terahertz
quantum level cascaded
laser comprises a semi-insulation GaAs substrate, a GaAs buffer layer, an n-type heavily-
doping lower
contact layer, an active region, an n-type heavily-
doping upper
contact layer, a first upper
electrode metal layer, a second upper
electrode metal layer and a lower
electrode metal layer, wherein the GaAs buffer layer is arranged on the upper surface of the semi-insulation GaAs substrate, the n-type heavily-
doping lower
contact layer is arranged on the surface of the GaAs buffer layer, the active region is arranged on the surface of the n-type heavily-doping lower contact layer, the n-type heavily-doping upper contact layer is arranged on the surface of the active region, the first upper electrode metal layer and the second upper electrode metal layer are arranged on the surface of the n-type heavily-doping upper contact layer and are arranged at spacing distance of L, the second upper electrode metal layer is an upper electrode metal layer capable of high-
waveguide loss after annealing, and the lower electrode metal layer is arranged on the surface of the n-type heavily-doping lower contact layer and on the two sides of the active region. With the terahertz
quantum level cascaded laser with integration of the absorption
waveguide and the fabrication method of the terahertz
quantum level cascaded laser, provided by the invention, the problems that THz absorbers are discrete devices and the used materials are highly different from THz QCL so that the THz absorbers cannot be used in an on-
chip integration
system based on a THz OQL material in the prior art are solved.