Single-mode tunable terahertz quantum cascade laser device structure and manufacturing method
A quantum cascade and device structure technology, which is applied to laser parts, optical waveguide semiconductor structures, lasers, etc., can solve the problems of large divergence angle of far-field beams, small wavelength tunable range, and reduced beam quality. Effects of device cost, reduction of far-field divergence angle, and improvement of beam quality
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Embodiment 1
[0054] see Figure 1 to Figure 2 , the present invention provides a device structure of a single-mode tunable terahertz quantum cascade laser, the device structure of the single-mode tunable terahertz quantum cascade laser at least includes: a semi-insulating GaAs substrate 6, a GaAs buffer layer 5, The first contact layer 4, the active region 3, the second contact layer 2, the first metal layer 1 and the second metal layer 7;
[0055] The semi-insulating GaAs substrate 6, the GaAs buffer layer 5, the first contact layer 4, the active region 3, the second contact layer 2 and the first metal layer 1 are stacked sequentially from bottom to top, the active region 3, the first The second contact layer 2 and the first metal layer 1 form a ridge structure 8 on the first contact layer 4; the side surface 81 of the ridge structure 8 is inclined relative to the end surface 82;
[0056] The ridge structure 8 is divided into a first sub-ridge structure 83 and a second sub-ridge structur...
Embodiment 2
[0072] This embodiment also provides a method for manufacturing a device structure of a single-mode tunable terahertz quantum cascade laser, such as Figure 4 As shown, the manufacturing method of the device structure of the single-mode tunable terahertz quantum cascade laser comprises the following steps:
[0073] Step 1: growing a buffer layer, an n-type heavily doped first contact layer, an active region, and an n-type heavily doped second contact layer on a semi-insulating GaAs substrate;
[0074] Step 2: The first photolithography and etching form a striped ridge structure, the side of the striped ridge structure is inclined relative to the end face; the angle of inclination is less than 30°;
[0075] Step 3: second photolithography and etching, forming a first electrode window on the surface of the striped ridge structure, the first electrode window is divided into two parts along the length direction by a gap structure; The first electrode metal is sputtered in the ele...
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