The invention discloses an epitaxial structure of a high-power
quantum cascade laser suitable for a high-temperature
working environment. The epitaxial structure comprises an InP substrate, an InP buffer layer, an InP lower limiting layer, an InGaAs lower
waveguide layer, an InGaAs / InAlAs
superlattice active region, an InGaAs upper
waveguide layer, an InP upper limiting layer and an InP
ohmic contact layer from bottom to top in sequence. The InGaAs / InAlAs
superlattice active region comprises a lasing region and a relaxation region, the lasing region is a core region for electrons to generate
laser through transition, the relaxation region is a channel for rapidly discharging the electrons through
phonon scattering and injecting the electrons into the next lasing region, and the lasing region and the relaxation region are alternately cascaded to jointly realize an efficient process that one
electron emits light for multiple times. Through a gradually-changed energy band structure, current carriers are prevented from escaping from a micro-strip above an upper lasing
energy level,
wave function overlapping between the
high energy level and an upper
excited state of an active region is reduced, current
carrier leakage is inhibited, through
effective strain compensation, net strain of an
epitaxial material is reduced, and the requirements of a
metal organic
chemical vapor deposition epitaxial process are met.