Lateral Bipolar Transistor with Composite Structure
A composite structure, bipolar triode technology, applied in the direction of semiconductor devices, electrical components, circuits, etc., can solve the problems that the reverse conduction voltage ratio can not be improved at the same time, achieve compact structure, reduce peak electric field, enhance exhaustion effect
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[0039] See figure 1 As shown, as the first embodiment of the present invention, a lateral bipolar transistor with a composite structure includes:
[0040] Including from bottom to top:
[0041] P + Silicon carbide substrate 2;
[0042] P - A silicon carbide epitaxial layer, the P silicon carbide epitaxial layer constitutes a P-type first RESURF region 3;
[0043] In the P - An N-type collector region 4 is formed on the silicon carbide by epitaxy, and N-type collector region 4 is formed near the upper surface by ion implantation. + Collector area ohmic contact area 6, floating ring FloatingRings 19 and injection type second RESURF area 5, wherein the N+ collector area ohmic contact area 6 is provided with a collector 9; the injection type second RESURF area 5 is used In a smooth drift region, as a specific embodiment of the present invention, the second RESURF region 5 is a P-type RESURF region, and the length of the second RESURF region 5 is the length of the drift region of the late...
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