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Resist stripping agent

A resist stripping agent, high-quality technology, applied in optics, instruments, optical mechanical equipment, etc., can solve the problem of water-soluble organic solvent treatment, damage productivity or workability, etc., and achieve the effect of excellent stripping performance

Active Publication Date: 2014-04-16
NOMURA MICRO SCI CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, either method has the problem of impairing productivity or workability
Especially in the latter method, in addition to the disposal of pure water used in rinsing, there is also a problem of disposal of water-soluble organic solvents used in rinsing.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

no. 1 Embodiment approach )

[0040] The first embodiment of the present invention contains: (A) 50 to 99 mass % of one or more compounds selected from ethylene carbonate, propylene carbonate, γ-butyrolactone, and cyclopentanone; and (B ) 1 to 50% by mass of glycerol carbonate.

[0041] The compounds used in this embodiment are those in Table 1 below.

[0042] In addition, for example, the normal working environment temperature in a clean room (clean room) of a factory is 22 to 27° C., so “room temperature” in the following description refers to this temperature range.

[0043]

[0044] Both (A) component and (B) component of the resist release agent of this embodiment have a five-membered ring structure in molecular structure. Furthermore, they have a common molecular structure in which one carbon atom constituting the five-membered ring constitutes a carbonyl group. Therefore, compatibility is good and it can mix easily. In addition, it has high solubility in a resist film, especially a resist film...

no. 2 Embodiment approach )

[0051] The resist stripper of the second embodiment uses ethylene carbonate as the (A) component. In this embodiment, only the component (A) of the first embodiment is ethylene carbonate, and the preferred ratio and more preferable ratio of the component (A) and the component (B) are the same as those of the first embodiment.

[0052] In addition, in this embodiment, when the ethylene carbonate content is 80% by mass or more, ethylene carbonate cannot be completely dissolved and precipitates at normal temperature. Therefore, at this time, it is necessary to heat up to the temperature at which ethylene carbonate dissolves and use it.

no. 4 Embodiment approach )

[0054] In the third and fourth embodiments, in the first embodiment, ethylene carbonate and propylene carbonate are used as the (A) component in a predetermined ratio.

[0055] In the resist release agent according to this embodiment, the content ratio of ethylene carbonate is 20 to 80% by mass, more preferably 55 to 75% by mass, and the content ratio of propylene carbonate is 5 to 30% by mass, more preferably 5 to 25% by mass. The ratio of the total amount of ethylene carbonate and propylene carbonate as the component (A) to the component (B) is the same as that of the first embodiment.

[0056] When the content of ethylene carbonate is 75% by mass or less, the melting point becomes 15° C. or less, and it becomes liquid at room temperature, thereby improving workability such as ease of metering.

[0057] The preferable ratio of (A) component and (B) component and its reason are the same as the description of 1st Embodiment.

[0058] (Fifth to Eighth Embodiments)

[0059] I...

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Abstract

Provided is a resist stripping agent which exhibits excellent stripping performance as a resist stripping agent and also causes no deposition or reattachment of a resist stripping substance to a substrate during rinsing with pure water. Further provided is a reusable resist stripping agent which is free of corrosive properties with respect to a metal wire, particularly a copper wire. The resist stripping agent is characterized by comprising (A) 50 to 99 mass% of at least one selected from ethylene carbonate, propylene carbonate, gamma-butyrolactone and cyclopentanone and (B) 1 to 50 mass% of glycerol carbonate.

Description

technical field [0001] The present invention relates to a resist stripping agent used for stripping a resist cover film after an etching operation in a photolithography process for forming a metal wiring pattern on a silicon substrate or a glass substrate. Background technique [0002] Conventionally, an amine-based resist release agent has been used as a release agent for a resist cover film made of novolac resin. As this amine-based resist stripper, for example, it is known to add a water-soluble organic solvent such as dimethyl sulfoxide and Water multi-component resist stripper (for example, refer to Patent Document 1). [0003] The above-mentioned amine-based resist release agent can form a salt with a photosensitive agent or a resin while cleaving a crosslinking point between a novolac resin and a photosensitive agent. As a result, the resist cover film becomes soluble and peels off from the substrate. [0004] However, among the components of the above-mentioned mu...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/42
CPCG03F7/422G03F7/42
Inventor 大坪博文石井庆一郎久保贤一柳基典
Owner NOMURA MICRO SCI CO LTD