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Circulating treatment system and method for etching solution

A processing system and etching technology, which is applied in the direction of photography technology, equipment, photography auxiliary technology, etc., can solve the problems of poor electrolysis effect, many solid impurities, high impurity rate of copper, etc., and achieve low cost, environmental protection and low cost. Effect

Inactive Publication Date: 2014-04-23
WESKY SUINING ELECTRONICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This invention can realize the recovery of the regeneration liquid, but the waste etching liquid has not undergone precipitation treatment, and the waste liquid contains many solid impurities, and the electrolyzed copper contains a high impurity rate, and the electrolysis effect is not good.

Method used

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  • Circulating treatment system and method for etching solution
  • Circulating treatment system and method for etching solution
  • Circulating treatment system and method for etching solution

Examples

Experimental program
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Effect test

Embodiment 1

[0035] Such as figure 1 As shown, after the etching treatment of the etching solution, the generated waste liquid passes through the tertiary precipitation of the sedimentation tank, and the solid complex in the waste liquid is filtered out. After the waste liquid flows into the waste liquid storage tank, hydrochloric acid solution is added to adjust the pH of the waste liquid. The value is 3, the temperature of the waste liquid is 20°C, the concentration of copper ions is 20g / l, the waste liquid enters the electrolytic cell, and the current density of the cathode is 400 A / m during electrolysis 3 , the current density of the anode is 100A / m 3 , the flow rate of the electrolyte during electrolysis is 1 m 3 / h, such a cycle will precipitate metal copper on the cathode electrolytic plate, and the electrolysis efficiency will reach 95%. The solution after electrolysis will flow into the etching cylinder through the regeneration mixing pool for recycling.

Embodiment 2

[0037] Such as figure 1As shown, after the etching treatment of the etching solution, the generated waste liquid passes through the tertiary precipitation of the sedimentation tank, and the solid complex in the waste liquid is filtered out. After the waste liquid flows into the waste liquid storage tank, hydrochloric acid solution is added to adjust the pH of the waste liquid. The value is 4, the temperature of the waste liquid is 30°C, the concentration of copper ions is 27g / l, the waste liquid enters the electrolytic cell, and the current density of the cathode is 800 A / m during electrolysis 3 , the current density of the anode is 80A / m 3 , the flow rate of the electrolyte during electrolysis is 1.2 m 3 / h, such a cycle will precipitate metal copper on the cathode electrolytic plate, and the electrolysis efficiency will reach 97%. The solution after electrolysis will flow into the etching cylinder through the regeneration mixing pool for recycling.

Embodiment 3

[0039] Such as figure 1 As shown, after the etching treatment of the etching solution, the generated waste liquid passes through the tertiary precipitation of the sedimentation tank, and the solid complex in the waste liquid is filtered out. After the waste liquid flows into the waste liquid storage tank, hydrochloric acid solution is added to adjust the pH of the waste liquid. The value is 2, the temperature of the waste liquid is 35°C, the concentration of copper ions is 35g / l, the waste liquid enters the electrolytic cell, and the current density of the cathode is 1500 A / m during electrolysis 3 , the current density of the anode is 150A / m 3 , the flow rate of the electrolyte during electrolysis is 1.5 m 3 / h, such a cycle will precipitate metal copper on the cathode electrolytic plate, and the electrolysis efficiency will reach 98%. The solution after electrolysis will flow into the etching cylinder through the regeneration mixing pool for recycling.

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Abstract

The invention discloses a circulating treatment system for an etching solution. The circulating treatment system comprises an etching platform, an etching tank, a settling tank, a waste solution storage tank, an electrolytic tank, a regeneration mixing tank and a master control center, wherein the etching tank is connected with the settling tank through a pipeline; the settling tank is connected with the waste solution storage tank through a pipeline; the waste solution storage tank is connected with the electrolytic tank through a pipeline; an outlet of the electrolytic tank is connected with the etching tank through the regeneration mixing tank; the control end of the master control center is connected with the positive and negative electrodes in the electrolytic tank. The circulating treatment system also comprises a circulating treatment method for an etching solution. The method mainly comprises the following five steps: generating a waste solution; settling; adjusting the waste solution; electrolyzing; recycling. Three-stage settlement and multi-filtration are adopted in the system and method, so that the system and the method have the advantages of good solid impurity removal effect, low cost, intelligent control, capability of acquiring and analyzing the relevant data of the waste solution in real time, energy saving, environment friendliness and good treatment effect.

Description

technical field [0001] The invention relates to a waste liquid treatment system, in particular to an etching liquid circulation treatment system and method. Background technique [0002] In industrial production, especially in the production process of PCB boards, acid etching is a common etching method. During the etching process, when the concentration of copper ions or cuprous ions in the acidic time solution increases to a certain value, the etching solution The copper foil cannot be etched stably and quickly, and the etching solution at this time becomes the etching waste solution. Acidic etching waste liquid is a strong acid solution polluted by a large amount of heavy metals. If it is directly discharged outside, it will cause great damage to the surrounding environment. Therefore, the correct treatment of acid etching solution is related to the dual issues of environment and factory benefits. [0003] The treatment methods of acidic etching solution include chemica...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23F1/46C25C1/12
CPCY02P10/20
Inventor 周小兵
Owner WESKY SUINING ELECTRONICS
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