Preparation method and system for micro-nano speckle

Abstract

The invention discloses a preparation method and system for micro-nano speckles, wherein the preparation method includes: generating a preset number of digital speckle figures with different speckle particle sizes and / or different speckle number, and selecting at least one digital speckle figure and serving as a speckle template; pre-processing regions to be processed of a test piece to be processed and a target test piece; leading the speckle template into speckle depositing equipment; focusing the region to be processed of the test piece to be processed to obtain an optimal parameter group under the current magnification times; regulating the speckle depositing equipment according to the optimal parameter group and depositing speckles on the region to be processed of the target test piece according to the speckle template. The preparation method for micro-nano speckles is capable of preparing high-quality micro-nano speckles and improving the speckle preparation repeatability, nondestructive performance and speed.

Description

technical field [0001] The invention relates to the field of photomechanics and deformation measurement, in particular to a method and system for preparing micro-nano speckles. Background technique [0002] With the rapid development of micro-nano technology, the performance index and reliability evaluation of micro-nano devices and structures requires the deformation measurement scale to reach the micro-nano level. The deformation measurement of micro-region puts forward higher requirements on the scale of deformation measurement carrier. Speckle is the most basic element in the field of digital image-related deformation measurement. The quality of the deformed speckle pattern on the surface of an object directly affects the accuracy of deformation measurement. At present, the conventional preparation methods of micro-nano speckles mainly include: artificial painting method, contact ultraviolet exposure method, electron beam lithography method, chemical vapor deposition me...

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Problems solved by technology

[0003] However, there are some problems in the above preparation methods: the speckle particles produced by the artificial painting method are relatively large, and the smallest size is on the order of submillimeters, which can only meet the requirements of macroscopic deformation measurement; electron beam lithography and contact ultraviolet The preparation process of the exposure method is complicated, time-consuming and expensive; the chemical vapor deposition method is to deposit different metal films on the surface of the test piece by chemical vapor phase, and obtain micro-nano speckles under humid and hot conditions, but this method depends heavily on the properties of the substrate and the film. And the preparation process may affect the physical and chemical properties of the test piece; the speckle produced by the nanoparticle spraying method cannot be specifically positioned, and the position of the speckle depends on the properties of the surface of the substrate test piece, and it is not easy to obtain repeatable results; focused ion beam The etching method will cause damage to the surface of the test piece, especially for the sample with thin film structure

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