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Method for manufacturing laminated composite MEMS(Micro-electromechanical Systems)chips and laminated composite MEMS chip

A manufacturing method and combined technology, which is applied in the direction of manufacturing microstructure devices, coatings, metal material coating processes, etc., can solve the problems of high cost and poor design flexibility, and achieve low cost, flexible design, and small volume.

Active Publication Date: 2014-07-16
ANHUI BEIFANG XINDONG LIANKE MICROSYST TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, in existing products, different MEMS structures are fabricated on the same MEMS layer, that is, accelerometers and gyroscopes, or two gyroscopes with different ranges are arranged horizontally, such as Invensense, Bosch, STMicroelectronics and other products, due to different The MEMS structure is made by the same MEMS layer, and the design flexibility is poor. Moreover, the working principles of the MEMS gyroscope and the accelerometer are different. The working performance is best under high pressure, generally above 0.1 atmospheric pressure, which requires MEMS chips to meet both requirements at the same time, that is, the MEMS gyroscope structure is fabricated in a lower air pressure, and the MEMS accelerometer structure is fabricated in a higher air pressure.
The existing dual pressure MEMS chip wafer-level packaging method was proposed by K. Reimer, Ch. Schr? A getter is made in one sealed cavity, and there is no getter in the other sealed cavity. When they are bonded to the wafer, a mixture of active gas and inert gas is sealed in the sealed cavity, and then heated and post-processed, there is a getter The active gas in the sealed cavity of the getter is absorbed, leaving only the inert gas, and the internal pressure is low. According to the ratio of the mixed gas, the pressure can be close to vacuum; while the active gas in the sealed cavity without the getter will not be absorbed. The gas pressure will not change, and the pressure is high, so as to achieve the purpose of dual-pressure wafer-level packaging. This method requires the use of getters, and the getters also need to be patterned, and the cost is high

Method used

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  • Method for manufacturing laminated composite MEMS(Micro-electromechanical Systems)chips and laminated composite MEMS chip

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Embodiment 1

[0036] A method for manufacturing a laminated combined MEMS chip, comprising the following steps:

[0037] (1) Formation of the first MEMS wafer 100A:

[0038] The material of the bottom plate wafer 101A is single crystal silicon with a crystal orientation. Through general semiconductor processing technology, a bottom plate insulating layer 102 is grown on the bottom plate wafer 101A. The material of the bottom plate insulating layer 102 is silicon dioxide. By applying glue, Exposure, development, etching and other semiconductor processing processes etch a bottom plate concave cavity 103a on the upper surface of the bottom plate wafer 101A, and the unetched part on the upper surface of the bottom plate wafer 101A becomes the first silicon pillar 101a and the bottom plate sealing area 101b, as figure 1 As shown, there is a base insulating layer 102 on the surface of the first silicon pillar 101a and the base sealing area 101b; the base cavity 103a is composed of a right half a...

Embodiment 2

[0057] The stacked combined MEMS chip 700 made in Embodiment 1, such as Figure 13 As shown, it is composed of a bottom plate 101, a first MEMS layer 104, a TSV integrated layer 410, a second MEMS layer 504 and a cover plate 501. There is a bottom plate cavity 103a on the bottom plate 101, and a cover plate cavity 503a on the cover plate. , the bottom cavity 103a and the TSV integration layer 410 form a lower sealing cavity 103, the cover cavity 503a and the TSV integration layer 410 form an upper sealing cavity 503, the internal air pressures of the two sealing cavities are different, and the first MEMS Layer 104 includes a first MEMS bonding region 104a, a first MEMS structure 104b and a first MEMS conductive region 104c, the first MEMS structure 104b is located in the lower sealed cavity 103, and the second MEMS layer 504 includes the first MEMS bonding region 504a, the first MEMS structure 504b and the first MEMS conductive region 504c, the second MEMS structure 504b is lo...

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Abstract

The invention discloses a laminated composite MEMS(Micro-electromechanical Systems)chip and a manufacturing method thereof. The method comprises the following steps: firstly, manufacturing a first MEMS wafer and a silicon perforation wafer, and bonding the first MEMS wafer and the silicon perforation wafer to obtain a sealing wafer; manufacturing an insulating layer and a metal layer on the sealing wafer to form a metalized sealing wafer, and bonding a second MEMS wafer onto the metalized sealing wafer to obtain a laminated composite MEMS wafer; finally, and cutting the laminated composite MEMS wafer to obtain the laminated composite MEMS chip. The method fully utilizes the area of the silicon perforation wafer, and at least one upper sealing cavity and at least one lower sealing cavity are respectively formed in the upper side and the lower side of the silicon perforation wafer. MEMS structures are arranged in the sealing cavities, the signals of the MEMS structures in the sealing cavities are led out through the metal layer, and shield metal layers are arranged among signal lines and are used for isolating interference among the electric signals of different MEMS structures. The laminated composite MEMS chip can meet the requirement of a composite motion sensor chip on different pressures and has the advantages of small size, high integration level, flexible design and low cost.

Description

technical field [0001] The invention belongs to the technical field of MEMS chip manufacturing, and in particular relates to a laminated combined MEMS chip, and also relates to a manufacturing method of the laminated combined MEMS chip. Background technique [0002] MEMS (Micro-Electro-Mechanical Systems) is the abbreviation of micro-electro-mechanical systems. MEMS manufacturing technology uses micro-fabrication technology, especially semiconductor wafer manufacturing technology, to manufacture various micro-mechanical structures, combined with application-specific control integrated circuits (ASICs), composed of Intelligent micro sensors, micro actuators, micro optical devices and other MEMS components. MEMS components have the advantages of small size, low cost, high reliability, strong resistance to harsh environments, low power consumption, high intelligence, easy calibration, and easy integration, and are widely used in consumer electronics products (such as mobile pho...

Claims

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Application Information

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IPC IPC(8): B81C1/00B81B7/00
Inventor 华亚平
Owner ANHUI BEIFANG XINDONG LIANKE MICROSYST TECH