Layered VO2 laser pulse modulation device and application thereof
A pulse modulation, VO2 technology, applied in the layered VO2 laser pulse modulation device and its application in all solid-state pulsed lasers, can solve the problems of complex manufacturing process, large volume, unfavorable integration of micro-nano devices, etc.
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Embodiment 1
[0050] VO 2 Pulse modulation device, including substrate and VO deposited on the substrate 2 material, structure such as figure 2 As shown, the substrate is magnesium fluoride substrate with a thickness of 1mm; the VO 2 The thickness of the material is 50nm, and it is processed into a rectangular sheet with a size of 2×2cm. The actual photo is as follows figure 1 shown.
[0051] VO grown on magnesium fluoride substrate 2 The preparation method is to use a polished magnesium fluoride single wafer in a specific direction as a substrate and obtain it by pulse laser deposition. See "Characterization of pulsed laser deposited MoS 2 by transmission electron microscopy", J. Mater. Res, 1993, 8(11): 2933.
[0052] VO of this embodiment 2 The pulse modulation device is applied in the following Examples 3 and 5 as a Q-switching device (Example 3) or a mode-locking device (Example 5) of a pulse-modulated laser for all-solid-state lasers.
Embodiment 2
[0053] Embodiment 2: As in Embodiment 1, the difference is that the substrate is a polycrystalline quartz plate with a thickness of 1-2mm; the VO 2 The material is 60nm thick and processed into circular flakes. The diameter is 2cm.
[0054] VO of this embodiment 2 The pulse modulation device is applied in the following embodiments 4 and 6 as a Q-switching device (embodiment 4) or a mode-locking device (embodiment 6) of a pulse modulation laser for all-solid-state lasers.
Embodiment 3
[0055] Example 3: An end-pumped VO 2 Q-switched device lasers
[0056] structured as image 3 As shown, the device includes pump source 3, fiber coupling system 4, focusing system 5, front cavity mirror 6, laser gain medium 7, VO 2 Modulation device 8 and output mirror 9 . where VO 2 Modulation device 8 is the product of embodiment 1.
[0057] The pumping source 3 is an LD laser with an emission wavelength of 808nm. The front cavity mirror 6 is a plane mirror, the surface near the pump source is coated with a dielectric film for anti-reflection of 808nm, and the surface near the resonant cavity is coated with a dielectric film with high reflection of 1.05-1.1 μm. Laser gain medium 7 is Nd:YAG crystal, Nd 3+ The ion concentration is 0.5at.%. The incident end face is coated with a dielectric film for anti-reflection of 808nm and 1064nm, and the exit end face is coated with a dielectric film for anti-reflection of 1064nm. VO 2 Modulation device 8 substrate does not grow V...
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