NbN-Ag hard thin film and preparation method thereof

A kind of thin film and hard technology, which is applied in the field of NbN-Ag hard structure thin film and preparation, coating and its preparation, can solve the problems of poor friction and wear performance of multilayer film at high temperature

Inactive Publication Date: 2014-09-10
JIANGSU UNIV OF SCI & TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In order to overcome the shortcomings of the existing NbN-based hard nanostructured composite films and multilayer films with poor high-temperature friction and wear properties, the present invention provides a NbN-Ag hard film, which has both high hardness and excellent friction and wear properties, and can be used as Structural hard film for high-speed, dry cutting

Method used

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  • NbN-Ag hard thin film and preparation method thereof
  • NbN-Ag hard thin film and preparation method thereof
  • NbN-Ag hard thin film and preparation method thereof

Examples

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preparation example Construction

[0020] The preparation of NbN-Ag thin film was completed on JGP-450 high vacuum multi-target magnetron sputtering equipment. The magnetron sputtering apparatus has three sputtering targets, which are respectively installed on three water-cooled brackets, and three stainless steel baffles are respectively installed in front of the three targets, and are automatically controlled by a computer.

[0021] A pure Nb target (99.9%) and a pure Ag target (99.95%) are used as double targets, respectively installed on independent radio frequency cathodes, and the target diameter is 75mm. The surface of hard alloy or ceramic substrate such as high-speed steel is mirror-polished, and the vacuum chamber is filled with Ar and N with a purity of 99.999%. 2 The mixed gas is used to deposit a NbN-Ag hard structure film by using a pure Nb target and a pure Ag target on a hard alloy or ceramic substrate to perform double-target confocal radio frequency reactive sputtering. Before depositing the ...

specific Embodiment

[0024] Embodiment 1-7 shown in table 1 has investigated the influence of different Ag contents on gained thin film film hardness and friction coefficient at normal temperature, and corresponding accompanying drawing sees figure 2 , 3 , 4, it can be seen that the Ag content is 5.27at.%, that is, the hardness is the highest when the Ag target is 20W and the Nb target is 200W.

[0025] Table 1

[0026]

[0027] The embodiment 8-10 shown in table 2 is that the Ag content is 5.27at.% NbN-Ag thin film carries out the investigation result of friction experiment, relevant accompanying drawing sees Figure 5 .

[0028] Table 2

[0029]

[0030] The above examples 1-10 only cite the situation where the Nb target power is fixed at 200W, and the argon-nitrogen flow ratio is 10:5. In actual operation, the operable power is Nb target power of 100-500W, and the sputtering pressure of the deposition process is 0.3 Pa, argon nitrogen flow ratio 10: (1 ~ 10).

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Abstract

The invention relates to an NbN-Ag hard thin film and a preparation method thereof. The NbN-Ag hard thin film is characterized in that the molecular formula thereof is NbN-Ag; the thickness is 1-5 microns; the content of Ag is 0-50 at.%, and is greater than 0; a high-purity Nb target and a Ag target are used as targets; the NbN-Ag hard thin film is obtained by depositing the targets on a hard alloy or ceramic matrix through a double-target confocal radio-frequency response method; in the deposition, the vacuum degree is lower than 3.0*10-3 Pa; the deposition is performed using argon to start arcing and using nitrogen as reaction gas; the sputtering pressure is 0.3 Pa; the nitrogen-argon flow ratio is 10: (1-10); the sputtering power of the Nb target is 100-500 W; and the sputtering power of the Ag target is 0-150 W. The preparation method has high production efficiency; and the obtained thin film has high hardness and excellent friction and wear resistance, and can be used as a high-speed dry cut structural hard thin film.

Description

technical field [0001] The invention relates to a coating and a preparation method thereof, in particular to a NbN-Ag hard structure thin film and a preparation method thereof, belonging to the technical field of ceramic coatings. Background technique [0002] Transition metal nitrides, such as TiN, have high hardness, wear resistance and excellent corrosion resistance, and are also used in many industrial fields. With the rapid development of manufacturing technology, especially the emergence of high-speed cutting, dry cutting and other processes, higher requirements are put forward for the cutting performance of cutting tools. Compared with TiN thin films, NbN thin films have a series of excellent properties such as high chemical and thermal stability and high hardness. Therefore, research on NbN thin films has attracted increasing attention in recent years. [0003] In recent years, multifunctional coatings formed by adding soft lubricating phases on hard wear-resistant ...

Claims

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Application Information

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IPC IPC(8): C23C14/34C23C14/16C23C14/18C04B41/88
Inventor 许俊华喻利花胡红霞
Owner JIANGSU UNIV OF SCI & TECH
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