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Device for preparing trichlorosilane

A technology of trichlorosilane and silicon tetrachloride, applied in the directions of halogenated silanes and halogenated silicon compounds, etc., can solve the problems of low boiling point of dichlorodihydrosilicon, technology blockade, immature technology, etc., so as to improve the utilization rate of raw materials , to solve the effect of enrichment

Inactive Publication Date: 2014-09-17
SHAANXI TIANHONG SILICON IND
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Problems solved by technology

[0005] For silicon tetrachloride, there are methods such as cold hydrogenation to treat it, so that it can be re-converted into trichlorosilane for reuse, but the domestic technology is immature, and the amount of silicon tetrachloride to be treated is large; Dihydrosilane, although there are relatively mature technologies abroad to prepare polysilicon using it as a raw material, due to technological blockade, this field is still almost blank in China, and the boiling point of dichlorodihydrosilane is relatively low, which is relatively dangerous.

Method used

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  • Device for preparing trichlorosilane

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Embodiment Construction

[0025] In order to make the technical means, creative features, goals and effects achieved by the present invention easy to understand, the present invention will be further described below in conjunction with specific illustrations.

[0026] refer to figure 1 , a device for preparing trichlorosilane, which converts dichlorodihydrosilane and silicon tetrachloride, the by-products in the production process of the improved Siemens method, into trichlorosilane.

[0027] After removing impurities in a rectifying tower, silicon tetrachloride reacts with a small amount of dichlorodihydrosilane in a solidified bed reactor equipped with a basic resin catalyst at a certain bed height to produce trichlorosilane and excess Silicon tetrachloride, enters the rectification tower containing the chimney tray, removes a small amount of silane and light component trace impurities from the top of the rectification tower, and the upper side of the rectification tower is discharged to other rectif...

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Abstract

The invention discloses a device for preparing trichlorosilane. The device comprises a rectifying tower, a silicon tetrachloride discharge pipe arranged at the bottom of the rectifying tower and a silicon tetrachloride discharge pipe arranged on the rectifying tower, a fixed bed reactor connected with the silicon tetrachloride discharge pipe, a mixing pipe provided with a static mixer, a trichlorosilane discharge pipe arranged in the middle position of the rectifying tower and an impurity outflow pipe arranged at the top position of the rectifying tower, wherein the fixed bed reactor is also connected to a dichlorosilane feed pipe, and the silicon tetrachloride discharge pipe and dichlorosilane feed pipe are subjected to cooperation by the mixing pipe; the discharge outlet of the fixed bed reactor is connected to the upper part of the rectifying tower by a synthesis gas pipe, and the impurity outflow pipe is connected to the reflux tank of the rectifying tower. By virtue of two devices, dichlorosilane and silicon tetrachloride as byproducts in the improved Siemens production process are converted into trichlorosilane, the utilization of raw materials is improved and the problem of enrichment of dichlorosilane and silicon tetrachloride is solved.

Description

technical field [0001] The invention relates to the field of trichlorosilane preparation, in particular to a device for preparing trichlorosilane. Background technique [0002] Trichlorosilane is also known as trichlorosilane, silicon chloroform, English name: trichiorosilane or silicochioroform, molecular formula is SIHCL 3 , used in the synthesis of organosilanes and alkyl, aryl and organofunctional group chlorosilanes, is the most basic monomer in organosilane coupling agents, and is also the raw material for the production of semiconductor silicon, single crystal silicon and polycrystalline silicon. [0003] Anti-disproportionation technology is a process of consuming silicon tetrachloride and dichlorodihydrosilane to generate trichlorosilane at a certain temperature and pressure under a specific bed height equipped with a specific resin. At the same time, the process of separating the product by rectification, the principle is: for a reversible reaction, when the volat...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/107
Inventor 秦渊博蒯伟赵亚文宋安宁曹奇刚刘佳
Owner SHAANXI TIANHONG SILICON IND
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