Trench barrier MOS Schottky diode device made of high-dielectric-constant gate medium material
A Schottky diode, high dielectric constant technology, applied in electrical components, semiconductor devices, circuits, etc., can solve problems affecting the electrical characteristics of diodes, reduce leakage current density, reduce leakage current, and enhance electric field coupling effect of action
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[0023] In order to describe the present invention more specifically, the technical solution of the present invention and its related principles and simulation process will be described in detail below in conjunction with the accompanying drawings and specific embodiments. In the simulation research of this patent, the optimal selection of various device parameters is as follows: the depth of the N-active region is 4um, and the doping concentration is 2×10 16 cm -3 ; The work function of the barrier metal of the Schottky junction at the anode terminal of the device is 5eV; the total depth of the trench is 1.65 μm; the thickness of the oxide layer in the trench is The width of the active region between the trenches is 0.7 μm. In addition, there is a unique parameter in the high dielectric constant gate dielectric TMBS device, that is, the height of the oxide of the high dielectric constant gate dielectric material (eg hafnium oxide, titanium oxide, etc.) on the inner wall of t...
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