Preparation technology of ZnSnOx ceramic target and method for preparing ZnSnOx coated film by using same

Abstract

The invention provides a ZnSnOx ceramic target which is characterized by being prepared by mixing zinc oxide powder the purity of which is 99.99 and tin oxide powder the purity of which is 99.99, wherein the mass percent of the zinc oxide powder to tin oxide powder is any one of (6:4)-(7:3). The invention further provides a preparation technology of the ZnSnOx ceramic target, and a method for preparing ZnSnOx coated film by using the ZnSnOx ceramic target. The prepared ZnSnOx thin film is pure, uniform in particle size, strong in the stability of sputtering voltage, the technology is easy to control, and the film layer is strong in binding power, and good in compactness, and can be applied into a low-radiation coated film glass under the oxygen-free condition.

Description

technical field [0001] The invention relates to the technical field of magnetron sputtering coated glass manufacturing, in particular to a preparation process of a zinc-tin oxide ceramic target and a method for preparing a zinc-tin oxide coating film using the target. Background technique [0002] In the field of magnetron sputtering coating, traditional zinc-tin oxide films are plated in argon and oxygen atmospheres through zinc-tin alloy targets. In order to obtain a stoichiometric zinc-tin oxide thin film, in actual process control, it is difficult to control the flow rate of oxygen. Especially, for the technical field of large-area coated glass, when depositing the above-mentioned zinc-tin oxide film, the flow of oxygen is too large, which will easily lead to the oxidation of the Ag layer as the infrared reflection function layer under the condition of rich oxygen; when the flow of oxygen is insufficient, in In the case of oxygen deficiency, the stability of the sputter...

AI Technical Summary

Problems solved by technology

Especially, for the technical field of large-area coated glass, when depositing the above-mentioned zinc-tin oxide film, the flow of oxygen is too large, which will easily lead to the oxidation of the Ag layer as the infrared reflection function layer under the condition of rich oxygen; when the flow of oxygen is insufficient, in In the case of oxygen deficiency, the stability of the sputtering process will be poor, such as large fluctuations in voltage, and the obtained film is a non-stoichiometric zinc-tin oxide film

More seriously, the obtained film is in a metallic state, which has a great negative impact on the thermal performance, appearance quality, and physical and chemical properties of glass coated products.

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