A kind of preparation method of sapphire substrate polishing liquid
A technology of sapphire substrate and polishing liquid, which is applied in the direction of polishing composition containing abrasives, etc., can solve the problems of easily scratched polishing sheet, low reuse rate, and many impurities in polishing liquid, and achieve low scratch rate and improved The effect of high yield rate and fast polishing rate
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[0032] A method for preparing a sapphire substrate polishing solution, the whole process is carried out in a class 10,000 clean room, and the specific steps are as follows:
[0033] (1) The airtight reaction tank is made of non-polluting acrylic material, and the airtight reaction tank is cleaned six times with ultra-pure water under vacuum negative pressure tumbling state before use.
[0034] (2) Use a 100-nanometer ceramic membrane filtration system to remove metal ions and other impurities in silica sol raw materials;
[0035] The above-mentioned silica sol is a silica sol with an average particle diameter of 85nm, a spherical colloidal particle shape, a dispersion degree of less than 0.001, and a Mohs hardness of 6.
[0036] (3) adding the above-mentioned filtered silica sol with a concentration of 49% in a closed reaction tank under vacuum negative pressure;
[0037] (4) under vacuum negative pressure state, guanidine carbonate accounting for 0.65% of the total weight of...
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