Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Nano microcapsule material having self-repairing and wear-resisting functions and preparation method thereof

A nano-microcapsule and microcapsule finishing technology, which is applied in the direction of microcapsule preparation, microsphere preparation, textiles and papermaking, etc., can solve the problems of microfiber ineffectiveness, unsuitability for ultra-thin down jackets, and reduction of air permeability of fabrics. Good anti-drilling fleece, enhanced anti-drilling fleece performance, excellent perspiration and moisture permeable effect

Active Publication Date: 2014-11-05
SUZHOU TANGHUA NANO TECH
View PDF8 Cites 9 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The fabric has fine fibers and low yarn count, so it is particularly easy to drill down, and it is easy to tear and wear
The biggest problem with ultra-thin down jackets is that down jackets are easy to break. The traditional calendering process does not work on ultra-fine fibers. Coating finishing and resin finishing will reduce the air permeability of the fabric, making wearing stuffy and increasing the weight of the fabric. It is not suitable for ultra-thin down jackets. light down jacket

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0039] This example provides a nano-microcapsule material with self-healing and wear-resistant functions, which is prepared by the following steps:

[0040] (1) Chitosan modification: Add acetic acid solution into the reactor, add chitosan under nitrogen protection, heat to 65°C and stir until chitosan is completely dissolved, add ammonium persulfate, N,N′- Methyl bisacrylamide and acrylic acid, react at 65°C for 4 hours, stop the reaction, add ethanol, stir for 30 minutes, add alkali to adjust the pH to 7, filter, wash with water, soak in absolute ethanol for 24 hours, take it out, and dry it in vacuum. Obtain a white fluffy solid, and the mass ratio of acetic acid, chitosan, ammonium persulfate, N,N'-methylenebisacrylamide, acrylic acid and ethanol in the acetic acid solution is 3.5:15:1.5:0.3 in sequence :1:4;

[0041] (2) Introducing self-healing groups: Add the above-mentioned white fluffy solid, trithiocarbonate, ether, and azobisisobutyronitrile into the reactor at a ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
diameteraaaaaaaaaa
diameteraaaaaaaaaa
Login to View More

Abstract

The invention relates to a nano microcapsule material and a preparation method thereof. The nano microcapsule material comprises a fabric base body prepared by fibers, and particularly also comprises a wall material cladded outside fiber-forming filaments and having nanoscale thickness; the wall material and the fibers form a nano microcapsule structure with the fiber-forming fine filaments as a 'core' and the wall material as a 'capsule sheath', the capsule sheath has adhesion, after being cladded with the capsule sheath, the fiber fine filaments are in mutual adhesion, so as to block gaps between the fibers; the fabric is used for production of ultra light and thin down jackets, can achieve quite good effect of penetration resistance to feathers, and cannot cause the fabric to become thick and gain weight and affect the wear comfort; and in addition, other properties of the fabric can be modified through introduction of functional auxiliary agents into the capsule sheath, for example, wear resistance of the fabric can effectively be enhanced through introduction of nano silica, or for example, the service life of the material can be effectively prolonged through introduction of self-repairing groups.

Description

technical field [0001] The invention relates to a material especially suitable for making ultra-light and thin down jackets, a preparation method and application of the material. Background technique [0002] An ultra-light down jacket weighs only a few dozen to one or two hundred grams, and can be put into a palm-sized pocket after folding. It is very popular among young fashion people. As a new high-end fashion warm clothing, the fabric is required to be light, soft, warm, and Moisture perspiration, anti-drilling fleece, bright colors, high gloss, abrasion resistance, water and oil repellency. Ultra-thin down jacket fabrics generally use fine denier nylon fabrics below 30D and 410T. The fabric has fine fibers and low yarn count, which is particularly easy to drill down, and it is easy to tear and wear. The biggest problem with ultra-thin down jackets is that down jackets are easy to break. The traditional calendering process does not work on ultra-fine fibers. Coating an...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): D06M23/12B01J13/02A41D3/00A41D31/00
Inventor 陈艳珍黄海彬孔颖
Owner SUZHOU TANGHUA NANO TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com