Gas-phase continuous preparation method and special device for single-walled carbon nanotube film

A technology of single-wall carbon nanotubes and special devices, applied in nanotechnology, nanotechnology, nanotechnology for materials and surface science, etc., can solve the problem of not meeting the requirements of continuous film formation and hindering single-wall carbon nanotube films Problems such as large-scale application process and inapplicability of single-walled carbon nanotube films have been achieved to achieve large-scale preparation and application, difficulty in uniformity control, and good uniformity

Active Publication Date: 2016-06-01
INST OF METAL RESEARCH - CHINESE ACAD OF SCI
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] Usually the microporous filter membrane is installed in the needle filter. On the one hand, the filter can only place a single filter membrane, and the diameter of the circular filter membrane is generally on the order of tens to tens of millimeters; on the other hand, the gas phase filtration process It needs to be carried out in a closed environment, which cannot meet the requirements of continuous film formation
Although the floating catalyst chemical vapor deposition method has the advantages and characteristics of macro-continuous synthesis of single-walled carbon nanotubes, the existing film-forming technology of carbon nanotubes is not suitable for continuous preparation of large-area, uniform, and density-controllable single-walled carbon nanotubes. Carbon nanotube films hinder the large-scale application of single-walled carbon nanotube films

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  • Gas-phase continuous preparation method and special device for single-walled carbon nanotube film
  • Gas-phase continuous preparation method and special device for single-walled carbon nanotube film
  • Gas-phase continuous preparation method and special device for single-walled carbon nanotube film

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Embodiment

[0047] In this embodiment, the gas-phase continuous film-forming device of single-walled carbon nanotubes is as figure 1 shown. Single-walled carbon nanotubes were prepared by floating catalyst chemical vapor deposition, using hydrogen as the carrier gas, methane as the growth carbon source, ferrocene as the catalyst precursor, and elemental sulfur as the growth promoter, in which ferrocene and elemental sulfur were fully Mix evenly and press into sheets. The mixing mass ratio of ferrocene and elemental sulfur is 200:1. The catalyst precursor is placed in the quartz boat at the inlet of the reaction chamber. In the heating stage, feed hydrogen gas with a flow rate of 500 sccm into the reaction chamber, and at the same time turn on the mechanical pump in the collection device, adjust the pressure regulating control valve so that the pumping rate is maintained at about 500 sccm, and the temperature of the chamber is raised from room temperature to 1100 °C . After the temperatu...

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Abstract

The invention relates to a preparation method of single-walled carbon nanotubes by a floating catalyst chemical vapor deposition process and a film continuous collection technology thereof, and specifically relates to a gas-phase continuous preparation method of a single-walled carbon nanotube film and a special device. The preparation method comprises the steps of depositing the single-walled carbon nanotubes synthesized by the floating catalyst chemical vapor deposition process onto the surface of a microporous filter membrane moving at a uniform speed by utilizing a gas-phase suction filtration device under normal-pressure and room-temperature conditions, controlling the movement speed of the microporous filter membrane, and regulating and controlling the gas flow balance to obtain a large-area, uniform and density-controllable single-walled carbon nanotube film. According to the gas-phase continuous film-forming technology of the single-walled carbon nanotubes, provided by the invention, the large-scale preparation of the large-area, uniform and density-controllable single-walled carbon nanotube film is realized under the normal-pressure and room-temperature conditions, the preparation method has important significance in promoting the progress of the single-walled carbon nanotube film in the field of large-scale preparation and application of optoelectronic devices, and the film has application in the field of large-scale preparation of the optoelectronic devices.

Description

technical field [0001] The invention relates to the preparation method of floating catalyst chemical vapor deposition of single-wall carbon nanotubes and its continuous film collection technology, in particular to a gas-phase continuous preparation method of single-wall carbon nanotube films and a special device. Background technique [0002] Transparent and flexible thin film transistor circuits have broad application prospects in the fields of electronic paper, flexible batteries, electronic labels, flexible transparent displays and other fields in the future. As a quasi-one-dimensional nanomaterial, carbon nanotubes have excellent electrical, optical and mechanical properties, and are suitable for the preparation of transparent conductive films and flexible thin film transistor circuits, which are expected to promote the development of flexible optoelectronic devices. [0003] The preparation methods of single-wall carbon nanotubes include arc discharge method, laser abla...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01B31/02B82Y30/00
Inventor 孙东明汪炳伟刘畅侯鹏翔成会明
Owner INST OF METAL RESEARCH - CHINESE ACAD OF SCI
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