Ethicng liquid composition, and method for preparing array substrate for use in liquid crystal display device
A technology of liquid crystal display devices and array substrates, which is applied in the manufacture of semiconductor/solid-state devices, electrical components, circuits, etc., can solve the problems of slow etching speed, low etching characteristics, and residue etching performance, so as to avoid residues and speed up the process , Improve the effect of etching speed
A technology of liquid crystal display devices and array substrates, which is applied in the manufacture of semiconductor/solid-state devices, electrical components, circuits, etc., can solve the problems of slow etching speed, low etching characteristics, and residue etching performance, so as to avoid residues and speed up the process , Improve the effect of etching speed
CN104419930AActive Publication Date: 2015-03-18DONGWOO FINE CHEM CO LTD
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Embodiment 1 to Embodiment 3 and comparative example 1 to comparative example 10
[0056] The manufacture of embodiment 1 to embodiment 3 and comparative example 1 to comparative example 10 etchant composition
[0057] According to the compositions shown in Table 1 below, etching liquid compositions of Examples 1 to 3 and Comparative Examples 1 to 10 were produced.
[0058] [Table 1]
[0059] (unit: weight percentage)
[0060]
[0061]
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The invention relates to an ethicng liquid composition, and a method for preparing an array substrate for use in a liquid crystal display device. The method comprises steps of forming grid wiring on a substrate, forming a grid insulation layer on the substrate containing the grid wiring, forming a semiconductor layer on the grid insulation layer, forming a source electrode and a drain electrode on the semiconductor layer, forming a pixel electrode connected with the drain electrode, and forming an electrode by etching films containing molybdenum metallic films or copper metallic films. A molybdenum alloy film is an alloy of niobium, tungsten or both with molybdenum. The ethicng liquid composition comprises, by weight percentage of total composition weight, 5.0%-25.0% of hydrogen peroxide, 0.01%-1.0% of fluorine compounds, 0.1%-5% of azole compounds, 0.1%-5.0% of water miscible compounds containing nitrogen atoms and carboxyl groups in a molecule, 0.1%-5.0% of phosphate compounds, 0.001%-5.0% of polyol surface active agents, and the balance of water. In addition, the ethicng liquid composition does not contain organic / inorganic acid or salt and cycloaliphatic amines
Description
technical field [0001] The present invention relates to a method for manufacturing an array substrate for a liquid crystal display device and an etchant composition for a multilayer film composed of a molybdenum alloy film of an alloy of one or more of niobium or tungsten and molybdenum and a copper-based metal film. Background technique [0002] Typical circuits for driving semiconductor devices and flat panel display devices are thin film transistors (TFT). In the manufacturing process of thin film transistors, a metal film is usually formed on the upper part of the substrate as a gate and data wiring material, and after forming a photoresist on a selective area of the metal film, the photoresist is used as a mask to etch the metal film. [0003] Generally, a copper-containing copper film or a copper alloy film having good conductivity and low electrical resistance, and a metal oxide film having excellent adhesion to the surface of these films are used as gate and data ...
Claims
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Patent Timeline
18 Mar 2015
Publication
CN104419930A
- IPC
- C23F1/14; H01L21/77
- Inventors
- 李恩远; 李智娟