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Photosensitive Resin Composition Used For Color Filter And Application Thereof

A technology for color filters and photosensitive resins, applied in the field of color filters, can solve the problems of poor development resistance, less relative usage, and poor stability of the viscosity of photosensitive resin compositions over time.

Inactive Publication Date: 2015-03-18
CHI MEI CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, the proportion of pigment contained in the photosensitive resin composition is getting higher and higher, and the relative usage amount of the alkali-soluble resin and the photosensitive monomer becomes smaller, resulting in a decrease in the degree of crosslinking after exposure, resulting in poor development resistance, etc. problem occurs
[0006] As disclosed in Japanese Patent Application Laid-Open No. 2004-138950, using a specific alkali-soluble resin can form a pixel layer with a flat surface, a color filter with excellent pattern shape, development resistance and brightness, but has photosensitivity The viscosity of the resin composition is poor in stability over time, etc.

Method used

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  • Photosensitive Resin Composition Used For Color Filter And Application Thereof
  • Photosensitive Resin Composition Used For Color Filter And Application Thereof
  • Photosensitive Resin Composition Used For Color Filter And Application Thereof

Examples

Experimental program
Comparison scheme
Effect test

Synthetic example A-1-1

[0143] With 100 parts by weight of fluorene epoxy compound (manufactured by Nippon Steel Chemical, the model is ESF-300; epoxy equivalent is 231), 30 parts by weight of acrylic acid, 0.3 parts by weight of benzyltriethylammonium chloride, 0.1 parts by weight of Parts of 2,6-di-tert-butyl-p-cresol and 130 parts by weight of propylene glycol methyl ether acetate are continuously added to a 500-milliliter four-necked flask, and the feed rate is controlled at 25 parts by weight / minute, and the temperature is maintained In the range of 100°C to 110°C. After reacting for 15 hours, a light yellow transparent mixed liquid can be obtained, and its solid content concentration is 50% by weight.

[0144] Then, 100 parts by weight of the above mixed solution was added to 25 parts by weight of ethylene glycol ether acetate, while adding 6 parts by weight of tetrahydrophthalic anhydride and 13 parts by weight of benzophenone tetracarboxylic dianhydride , and heated to 110°C to 115°C. After...

Synthetic example A-1-2

[0146] With 100 parts by weight of fluorene epoxy compound (manufactured by Nippon Steel Chemical, the model is ESF-300; epoxy equivalent is 231), 30 parts by weight of acrylic acid, 0.3 parts by weight of benzyltriethylammonium chloride, 0.1 parts by weight of Parts of 2,6-di-tert-butyl-p-cresol and propylene glycol methyl ether acetate of 130 parts by weight are continuously added to the four-necked flask of 500 milliliters, and the feeding speed is controlled at 25 parts by weight / minute, and the temperature is maintained at Within the range of 100° C. to 110° C., after 15 hours of reaction, a light yellow transparent mixed liquid with a solid content concentration of 50 weight percent can be obtained.

[0147] Next, 100 parts by weight of the above mixed solution was dissolved in 25 parts by weight of ethylene glycol ether acetate, and 13 parts by weight of benzophenone tetracarboxylic dianhydride was added at the same time, and heated to 90°C to 95°C. After reacting for 2...

Synthetic example A-1-3

[0149]With 400 parts by weight of epoxy compound (manufactured by Nippon Kayaku Co., Ltd., model is NC-3000; epoxy equivalent is 288), 102 parts by weight of acrylic acid, 0.3 parts by weight of methoxyphenol (methoxyphenol), 5 parts by weight Parts of triphenylphosphine and 264 parts by weight of propylene glycol methyl ether acetate were added into the reaction flask, and the temperature was maintained at 95°C. After reacting for 9 hours, an intermediate product with an acid value of 2.2 mgKOH / g can be obtained. Then, add 151 parts by weight of tetrahydrophthalic anhydride (tetrahydrophthalic anhydride), and react at 95° C. for 4 hours to obtain alkali-soluble resin (A-1-3), whose acid value is 102 mgKOH / g, And the weight average molecular weight was 3200.

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Abstract

The present invention relates to a photosensitive resin composition used for a color filter and an application thereof. The photosensitive resin composition contains a binder polymer (A), a compound (B) possessing an ethylene unsaturation group, a photoinitiator (C), an organic solvent (D),a pigment(E) and a compound (F). The binder polymer (A) possesses a first binder polymer (A-1) obtained by carrying out a polymerization reaction on a mixture, wherein the mixture contains an epoxy compound (i) possessing at least two epoxy groups and a compound (ii) possessing at least one carboxylic group and at least one ethylene unsaturation group. The photosensitive resin composition used for the color filter possesses good developing resistance and viscosity stability.

Description

technical field [0001] The invention relates to a photosensitive resin composition for a color filter of a liquid crystal display and the formed color filter. In particular, there is provided a photosensitive resin composition for color filters which is excellent in development resistance and viscosity stability over time. Background technique [0002] At present, color filters have been widely used in application fields such as color liquid crystal displays, color facsimile machines, and color cameras. As the market demand for imaging equipment such as color liquid crystal displays is expanding day by day, the production technology of color filters is also tending to be diversified. [0003] Usually, the color filter can be obtained by forming red, green, blue pixels on a transparent glass substrate by dyeing, printing, electroplating, pigment dispersion and other methods. Generally speaking, in order to improve the contrast of the color filter, a light-shielding layer (o...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/027G03F7/004G02B5/20G02F1/1335
Inventor 王端志许荣宾
Owner CHI MEI CORP
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