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Positive type photoresist stripping agent

A technology of photoresist stripping agent and photoresist, which is applied in the direction of photosensitive material processing, etc., can solve the problems of high evaporation rate, limit the service life of photoresist stripper bath, and cannot remove photoresist, so as to achieve low evaporation rate and increase operation Safety, easy recycling effect

Inactive Publication Date: 2015-03-18
THE CHEMOURS CO FC LLC
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  • Summary
  • Abstract
  • Description
  • Claims
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Problems solved by technology

[0009] In addition, due to the high volatility of the components of many known photoresist strippers, it is easy to cause their evaporation rate to be too high, thereby limiting the bath life of these photoresist strippers, and during their storage and use, they need Take special precautions for human and environmental safety
[0010] However, photoresist strippers of simple composition available so far cannot completely remove photoresist from various substrates.

Method used

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  • Positive type photoresist stripping agent
  • Positive type photoresist stripping agent
  • Positive type photoresist stripping agent

Examples

Experimental program
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Effect test

Embodiment

[0085] Material:

[0086] Diethylenetriamine (DETA), monoethanolamine (MEA), N-methylpyrrolidone (NMP), N,N-dimethylformamide (DMF), N,N-dimethylacetamide (DMAc) and N , N-diethylacetamide (DEAc) was purchased from Alfa

[0087] N,N-Dimethylpropanamide (DMPA) was purchased from Tokyo Chemical Industry Co., Ltd. .

[0088] Fluorosurfactant (FS) is a nonionic fluorosurfactant obtained from DuPont, which is a polyoxyethylene compound substituted by fluorinated fatty alcohol, and its trade name is FS-3100.

[0089] The positive photoresist is model Echem TM120SL, purchased from eChem Solutions Corp.

[0090] The water is deionized water.

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Abstract

The invention discloses a photoresist stripping agent. The photoresist stripping agent comprises the following components: (a) 18wt%-80wt% of diethylenetriamine; (b) 18wt%-80wt% of alkyl amide which is selected from one or a mixture of N,N-diethylacetamide and N,N-dimethylpropanamide; and (c) 0wt%-2wt% of a fluorine-containing surfactant, wherein the weight percent is on the basis of the total weight of the photoresist stripping agent. Furthermore, the invention further discloses a method for removing a photoresist by using the photoresist stripping agent.

Description

technical field [0001] The present invention relates to a photoresist stripper containing an alkyltriamine, an alkylamide and optionally a small amount of a fluorosurfactant, and is particularly concerned with the removal of Positive photoresist in the eBook. Background technique [0002] The technology industry continues to develop and progress, and the technology of thin film transistor liquid crystal display (TFT-LCD) is constantly evolving, and because thin film transistor liquid crystal display has small size, no space, low power consumption, low radiation, and durable products, etc. Therefore, it has gradually replaced displays made of cathode ray tubes (CRT). Moreover, as the demand for displays continues to increase, the output of thin-film transistor liquid crystal displays is gradually increasing, and following the evolution of technology generations, five-generation, six-generation, seven-generation, eighth-generation, and even ten-generation factories are consta...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/42
Inventor 李豪浚吕勇军
Owner THE CHEMOURS CO FC LLC
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