MBS resin with impact resistance, stress crease and fold resistance and excellent transparency
A stress-resistant and impact-resistant technology, applied in the field of MBS resin, can solve problems such as reduced transparency, and achieve the effects of improving light transmittance, improving impact strength, and improving stress whitening resistance.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Example Embodiment
[0051] Example 1
[0052] Prepare the MBS resin with impact resistance, stress whitening resistance and high light transmittance of the present invention according to the following steps
[0053] ①. Preparation of seed emulsion:
[0054] a. Feeding heating
[0055] In the seed emulsion polymerization reactor, 60 parts by weight of non-ionized water, 0.2 parts by weight of potassium stearate as emulsifier, 0.08 parts by weight of potassium perfluoroalkyl ether carboxylate as dispersant, 0.3 parts by weight of potassium chloride as electrolyte, 0.04 parts by weight of dodecyl mercaptan as molecular weight regulator, 0.3 parts by weight of diallyl phthalate as crosslinking agent, 12 parts by weight of styrene, 0.08 parts by weight of initiator potassium persulfate, and high-purity nitrogen to replace the inside of the kettle After airing, add 17 parts by weight of butadiene and 6 parts by weight of hexafluoropropylene; stir and mix for 15-30 minutes, slowly raise the temperature, and ra...
Example
[0071] Examples 2-7
[0072] According to the method and steps of Example 1, the MBS resin with impact resistance, stress whitening resistance and high light transmittance of the present invention was prepared according to the raw material formula of Table 1
[0073] Table 1
[0074]
[0075]
[0076]
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap