Supercharge Your Innovation With Domain-Expert AI Agents!

MBS resin with impact resistance, stress crease and fold resistance and excellent transparency

A stress-resistant and impact-resistant technology, applied in the field of MBS resin, can solve problems such as reduced transparency, and achieve the effects of improving light transmittance, improving impact strength, and improving stress whitening resistance.

Active Publication Date: 2015-03-25
SHANDONG RUIFENG CHEM
View PDF5 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In addition, the impact resistance and transparency of MBS are also contradictory, and the improvement of impact resistance is often accompanied by the decrease of transparency.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • MBS resin with impact resistance, stress crease and fold resistance and excellent transparency
  • MBS resin with impact resistance, stress crease and fold resistance and excellent transparency
  • MBS resin with impact resistance, stress crease and fold resistance and excellent transparency

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0052] According to the following steps, the impact resistance of the present invention, stress-resistant whitening, MBS resin with high light transmittance are prepared

[0053] ①. Preparation of seed emulsion:

[0054] a. Feed and heat up

[0055] In the seed emulsion polymerization reactor, drop into 60 parts by weight of deionized water, 0.2 parts by weight of emulsifier potassium stearate, 0.08 parts by weight of dispersant potassium perfluoroalkyl ether carboxylate, 0.3 parts by weight of electrolyte potassium chloride, 0.04 parts by weight of molecular weight regulator dodecyl mercaptan, 0.3 parts by weight of diallyl phthalate crosslinking agent, 12 parts by weight of styrene, 0.08 parts by weight of initiator potassium persulfate, replace the still with high-purity nitrogen After air, add 17 parts by weight of butadiene and 6 parts by weight of hexafluoropropylene; stir and mix for 15 to 30 minutes, slowly raise the temperature, and raise the temperature to 48°C in h...

Embodiment 2～7

[0072] According to the method and steps of Example 1, the MBS resin with high impact resistance, stress whitening resistance and light transmittance of the present invention is prepared according to the raw material formula in Table 1

[0073] Table 1

[0074]

[0075]

[0076]

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses MBS resin with impact resistance, stress crease and fold resistance and excellent transparency and belongs to the only high-molecular compound obtained through C-C unsaturated bond reaction. The MBS resin contains fluorine, comprises a repetition structure unit from hexafluoropropylene in the molecular structure and is realized in the following steps: in the seed emulsion preparation steps, styrene and butadiene polymerization monomers as well as hexafluoropropylene polymerization monomers are added to participate in emulsion polymerization reaction. The polyvinyl chloride modifier MBS resin product which can improve the shock strength and the stress crease and fold resistance and is high in light transmittance and excellent in optical performance is provided, so that the shock strength of the MBS resin is remarkably improved, the stress crease and fold resistance is radically improved, the light transmittance is improved, and the MBS particle diameter is increased from 80nm to 240 nm.

Description

technical field [0001] The invention is an MBS resin with good impact resistance, stress whitening resistance and good transparency. It belongs to the polymer compound obtained only by the reaction of carbon-carbon unsaturated bonds. Background technique [0002] Polyvinyl chloride (PVC) is a thermoplastic polymer material developed earlier, with high strength, wear resistance, flame retardancy, electrical insulation, good chemical corrosion resistance, excellent optical properties and low price. Industrial and civilian markets have broad prospects. However, due to the PVC resin itself, there are many defects in plasticizing processing performance, thermal stability, oxidation resistance, impact resistance, bending and folding resistance, etc. As a result, it is limited in practical industrial manufacturing applications. Over the years, PVC resin has been successfully applied in various fields of construction, telecommunications, transportation, chemical industry, packagi...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C08F279/02C08F212/08C08F220/14C08F214/28C08F2/26C08F2/38C08L27/06C08L51/04
Inventor 刘春信张振国张海瑜唐晓明
Owner SHANDONG RUIFENG CHEM
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com