A preparation method of semi-melting high-efficiency ingot and semi-melting high-efficiency seed crystal retention auxiliary plate
An auxiliary plate and high-efficiency technology, applied in chemical instruments and methods, crystal growth, single crystal growth, etc., can solve the problem of low utilization rate of silicon material, increase production cost of high-efficiency silicon ingot casting, and difficulty in retaining seed crystals of edge crystal bricks, etc. It can reduce the processing difficulty and cleaning loss, improve the photoelectric conversion efficiency, and improve the crystal growth quality.
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Embodiment
[0029] As shown in the figure, a method for preparing a semi-melted high-efficiency ingot, the method steps are as follows:
[0030] 1) First place the seed crystal retention auxiliary plate symmetrically on the bottom of the crucible that has been sprayed with silicon nitride coating, and the width of the four sides of the seed crystal retention auxiliary plate from the four walls of the crucible is between 2 mm;
[0031] 2) Lay a layer of seed crystal made of single crystal silicon material on the bottom of the crucible where the semi-melted high-efficiency seed crystal retention auxiliary plate is placed. The size of the seed crystal is between 5 and 10mm to form a seed crystal layer. The seed crystal layer laying height 10mm beyond the highest point of the semi-melted high-efficiency seed crystal retaining auxiliary plate, and spread and compact the entire crucible; then fill the bulk primary silicon material above the seed crystal layer;
[0032] 3) Heating to completely ...
Embodiment 2
[0036] As shown in the figure, a method for preparing a semi-melted high-efficiency ingot, the method steps are as follows:
[0037] 1) First place the seed crystal retention auxiliary plate symmetrically on the bottom of the crucible sprayed with silicon nitride coating, the width of the four sides of the seed crystal retention auxiliary plate from the four walls of the crucible is 5mm;
[0038] 2) Lay a layer of seed crystal mixed with single crystal and polycrystalline silicon materials on the bottom of the crucible where the semi-melted high-efficiency seed crystal retention auxiliary plate is placed. The size of the seed crystal is between 5 and 10mm to form a seed crystal layer. The laying height exceeds the highest point of the semi-melted high-efficiency seed crystal retaining auxiliary plate by 15mm, and it is laid flat and compacted inside the entire crucible; then the bulk primary silicon material is placed above the seed crystal layer;
[0039] 3) Heating to comple...
Embodiment 3
[0043] As shown in the figure, a method for preparing a semi-melted high-efficiency ingot, the method steps are as follows:
[0044] 1) First place the seed crystal retaining auxiliary plate symmetrically on the bottom of the crucible sprayed with silicon nitride coating, the width of the four sides of the seed crystal retaining auxiliary plate from the four walls of the crucible is 3mm;
[0045] 2) Lay a layer of seed crystals made of polysilicon material on the bottom of the crucible where the semi-melted high-efficiency seed crystal retention auxiliary plate is placed. The size of the seed crystals is between 5 and 10 mm to form a seed crystal layer. The high-efficiency seed crystal retains the highest point of the auxiliary plate at 13mm, and spreads and compacts the entire crucible inside; then loads a block of primary silicon material above the seed crystal layer;
[0046] 3) Heating to completely melt the silicon material above the seed layer, and the seed layer is only...
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Abstract
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