Online normal-pressure chemical vapor deposition film-plating reactor through floatation process

Abstract

The invention discloses an online normal-pressure chemical vapor deposition film-plating reactor through a floatation process. The online normal-pressure chemical vapor deposition film-plating reactor disclosed by the invention comprises a heat preservation shell and a bottom plate, wherein a gas inlet chamber and an exhaust chamber are arranged in the heat preservation shell; a slit communicated with the gas inlet chamber and an exhaust hole communicated with the exhaust chamber are arranged on the bottom plate; a pre-mixing chamber and a waste gas chamber are also arranged in the heat preservation shell; the pre-mixing chamber is connected to a film-plating precursor gas inlet pipe and embedded in the waste gas chamber; the exhaust chamber is connected into the waste gas chamber; the gas inlet chamber is communicated with the pre-mixing chamber through a gas inlet channel; the gas inlet chamber is arranged over the bottom plate and is shaped as a wide mouth gradually widened along the airflow direction; a flow-mixing baffle for forming up and down airflows is installed in the gas inlet chamber; the exhaust chamber is of a structure with a large upper part and a small lower part; and a dust collecting plate is installed in the exhaust chamber. By means of the gas mixing chamber structure in the invention, multi-charge and multi-discharge steady airflow trends are formed easily, pre-heating is strengthened, the flow is convenient to adjust, the film-plating efficiency is increased, and thus, the film-plating quality is increased.

Description

technical field [0001] The invention relates to the technical field of chemical vapor deposition coating and deep processing of float glass, in particular to an on-line float glass normal-pressure chemical vapor deposition coating reactor, which deposits a film on the float on-line glass by using an atmospheric-pressure chemical vapor deposition reaction. Background technique [0002] Chemical vapor deposition (CVD) is currently the most common method for obtaining large-area thin films. The method obtains strong bonding force between the thin film and the deposition substrate, compact structure of the thin film body, fast coating speed, simple preparation process, low cost, wide range of thin film materials, and easy industrial production. Among them, the atmospheric pressure chemical vapor deposition method (APCVD) refers to a CVD coating method in which the coating environment pressure is similar to the atmospheric pressure. It is widely used in the field of float online ...

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Problems solved by technology

[0003] Chinese patent CN100340512C discloses a float online coating device, which adopts a linear multi-inlet and multi-row structure, and the coating gas reaches the surface of the glass ribbon through the nozzle in the vertical direction, and the coating reaction occurs, without considering the blockage of the exhaust pipe by the backflow of exhaust dust , did not utilize the exhaust waste heat, did not strengthen the preheating of the precursor gas; Chinese patent CN103058530A discloses a double-inlet, double-row on-line coating device, the reaction gas intake method is still vertical and directly reaches the surface of the glass ribbon ; Chinese patent CN103121798A and Chinese patent CN103466955A respectively disclose a coating device and coating technology based on the APCVD method, but there is no clear description of the coating reactor and its intake structure

Due to the uniformity of the coating, the reaction gas is mainly in a laminar flow state on the surface of the deposited float glass ribbon. The vertical spraying and the uneven distribution of the gas flow in the exhaust chamber cannot make the reaction gas form a stable laminar flow on the surface of the glass ribbon. The heating method is only heat conduction and radiation heating in contact with the surface of the glass ribbon, and the convection heating method with optimal efficiency in gas phase heat transfer is greatly weakened

This situation greatly reduces the thermal efficiency of APCVD coating, so that the coating reaction must be carried out stably in a higher temperature range and narrower temperature window, which seriously limits the efficiency and quality of APCVD coating.

The backflow of dust in the exhaust chamber will not only cause the blockage of the exhaust chamber and affect the exhaust process, but also cause the pollution of the glass ribbon coating, which seriously affects the quality of the APCVD coating.

This greatly increases the cost of APCVD float in-line glass coating

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