Perovskite cathode film and preparation method thereof
A perovskite-type, thin-film technology, applied in battery electrodes, electrical components, circuits, etc., can solve problems such as the inability to prepare perovskite-type thin films, and achieve the effect of improving electrocatalytic performance and reducing cathode polarization resistance.
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Embodiment 1
[0020] In nickel oxide with Y 2 o 3 Stable ZrO 2 Composite Anode / Y 2 o 3 Stable ZrO 2 Sputtered La with (100) crystal plane preferred orientation on membrane electrode (NiO-YSZ / YSZ) 0.9 Sr 0.1 MnO 2+d For the thin film, the anode-supported membrane electrode was ultrasonically cleaned with acetone, ethanol, and distilled water in sequence, and after drying, it was placed in the vacuum chamber of the magnetron sputtering apparatus, and the target-base distance was adjusted to about 6 cm, and the La / Sr / Mn The alloy material is the target material, the purity of the target material is above 99.99%, the molar ratio of La / Sr / Mn is 9 / 1 / 10, and the vacuum is 8*10 -4 Pa, then heat the substrate table, the temperature rises to 100°C, the argon flow rate is 10.0 sccm, the oxygen flow rate is 1.2 sccm, and the sputtering power is 9W / cm 2 , the sputtering pressure is 0.5Pa, the rotation speed of the substrate table is set at 5 cycles / min, and the thickness is about 500nm. 0.9 Sr ...
Embodiment 2
[0022] In nickel oxide with Y 2 o 3 Stable ZrO 2 Composite Anode / Y 2 o 3 Stable ZrO 2 Sputtered La with (110) crystal plane preferred orientation on membrane electrode (NiO-YSZ / YSZ) 0.8 Sr 0.2 co 0.2 Fe 0.8 o 2-d For the thin film, the anode-supported membrane electrode was ultrasonically cleaned with acetone, ethanol, and distilled water in sequence, and after drying, it was placed in the vacuum chamber of the magnetron sputtering instrument, and the target-base distance was adjusted to about 6 cm. La / Sr / Co / Fe alloy material is used as the target material, the purity of the target material is above 99.99%, the molar ratio of La / Sr / Co / Fe is 8 / 2 / 2 / 8, and the vacuum is 8*10 -4 Pa, then heat the substrate table, the temperature rises to 200°C, the flow rate of argon gas is 10.0 sccm, the flow rate of oxygen gas is 1.2 sccm, and the sputtering power is 9W / cm 2 , the sputtering pressure is 0.5Pa, the rotation speed of the substrate table is set at 5 cycles / min, and the t...
Embodiment 3
[0024] In nickel oxide with Y 2 o 3 Stable ZrO 2 Composite Anode / Y 2 o 3 Stable ZrO 2 Sputtered La with (110) crystal plane preferred orientation on membrane electrode (NiO-YSZ / YSZ) 0.6 Sr 0.4 co 0.2 Fe 0.8 o 2-d For the thin film, the anode-supported membrane electrode was ultrasonically cleaned with acetone, ethanol, and distilled water in sequence, and after drying, it was placed in the vacuum chamber of the magnetron sputtering instrument, and the target-base distance was adjusted to about 6 cm. La / Sr / Co / Fe alloy material is the target material, the purity of the target material is above 99.99%, the molar ratio of La / Sr / Co / Fe is 6 / 4 / 2 / 8, and the vacuum is 8*10 -4 Pa, then heat the substrate table, the temperature rises to 200°C, the flow rate of argon gas is 10.0 sccm, the flow rate of oxygen gas is 0.7 sccm, and the sputtering power is 9W / cm 2 , the sputtering pressure is 0.5Pa, the rotation speed of the substrate table is set to 5 cycles / min, and the thickness...
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