Device and method for uniform treatment of aqueous solution by plasma jet array

A plasma and uniform treatment technology, which is applied in the direction of biological treatment devices, special treatment targets, chemical instruments and methods, etc., can solve the problems of stainless steel electrodes increasing the complexity of the device, hidden safety hazards, uneven water treatment, etc., to achieve easy industrial Transformation, guaranteed uniformity and continuity, simple structure effect

Active Publication Date: 2016-08-31
INST OF ELECTRICAL ENG CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Stainless steel electrodes add complexity to the setup and pose a safety hazard
In addition, plasma only treats the surface of the water body, it is difficult to treat the water at the bottom, and the treatment of the water will be extremely uneven

Method used

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  • Device and method for uniform treatment of aqueous solution by plasma jet array
  • Device and method for uniform treatment of aqueous solution by plasma jet array

Examples

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Comparison scheme
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Embodiment 1

[0030] Example 1, such as figure 1 As shown, a device for uniformly treating aqueous solution with a plasma jet array according to an embodiment of the present invention, the device includes: a device body, the device body includes a plasma jet array structure, a power supply 7, a gas device, and a water treatment device; The middle part of the plasma jet array structure is connected to the power supply 7, the upper end of the plasma jet array structure communicates with the gas device, and a matching water treatment device is provided below the plasma jet array structure; the plasma jet array structure The volume jet array structure includes a plurality of plasma jet devices with the same structure; the plasma jet device includes an insulating medium 3, and the upper and lower parts of the insulating medium 3 are surrounded by metal rings 1 and 2; Described power supply 7 comprises high voltage pole and ground pole, and described high voltage pole, described ground pole are c...

Embodiment 2

[0038] Example 2, such as figure 2 As shown, the present invention also provides a device treatment method for uniform treatment of aqueous solution by a plasma jet array, the treatment method comprising the following steps:

[0039] Step 101: Start the gas device and the power supply to provide power for the plasma jet device, and the plasma jet device generates a plasma flame;

[0040] Step 102: The plasma flame is treated with the pumped water column, and the treated solution enters the treatment liquid storage bottle for storage.

[0041] Further, in step 101, the gas bottle provides the gas required for discharge, and the gas flow rate is precisely controlled by the flowmeter. After the plasma array structure is fed with gas, the power is turned on, the gas is excited, and the gas is generated at the outlet of the plasma jet array structure. Plasma flames for solution surface treatment.

[0042]Further, in step 102, after turning on the submersible pump inside the orig...

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Abstract

The invention relates to a device for uniformly treating aqueous solution by utilizing a plasma jet array. The plasma jet array structurally comprises multiple plasma jet devices with the same structure; each plasma jet device comprises an insulating medium I, a metal ring I and a metal ring II respectively surround the upper part and the lower part of each insulating medium I; a power supply comprises a high pressure pole and an earth pole which are respectively connected with the metal rings I and the metal rings II; the plasma jet array structure can be applied to large-area aqueous solution treatment; a fountain type water column can guarantee uniformity and continuity of aqueous solution treatment; the plasma jet array structure is separated from aqueous solution in a water treatment device, and distance between the plasma jet array structure and the water treatment device can be adjusted, so that plasma discharge is not influenced by the aqueous solution, and discharging stability is realized. The device for uniformly treating the aqueous solution by utilizing the plasma jet array is wide in application range and can be applied to industrial wastewater treatment and sewage treatment, sterilization of the aqueous solution and preparation of disinfectant fluid, and no secondary pollution can be produced; meanwhile, the structure is simple, the cost is low, the operation is easy, the production can be amplified, and the industrialization can be easily realized.

Description

technical field [0001] The invention relates to the technical field of a water treatment device and a treatment method, in particular to a device and a treatment method for uniform treatment of an aqueous solution by a plasma jet array. Background technique [0002] Atmospheric pressure low-temperature plasma has attracted extensive attention in water treatment technology due to its characteristics of high active particles, high energy efficiency, low cost and low pollution. Low-temperature plasma produces high-energy electrons, high-energy active substances (active oxygen, active nitrogen), ozone and ultraviolet light and other short-term material components, which can effectively degrade pollutants and sterilize water bodies. In addition, the active substances generated by the plasma interact with water to produce long-term bactericidal substances, such as H2O2, HNO3, HNO2, etc. Therefore, the plasma-treated water also has the function of sterilization and disinfection wit...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B01J19/08C02F1/30
CPCB01J19/08B01J2219/00018B01J2219/00033C02F1/30C02F2203/00C02F2303/04
Inventor 王瑞雪邵涛章程严萍
Owner INST OF ELECTRICAL ENG CHINESE ACAD OF SCI
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