Multi-arc ion physical plating paint used for replacing chemical electroplating

Abstract

The invention discloses a multi-arc ion physical plating paint used for replacing chemical electroplating. The multi-arc ion physical plating paint is composed of following raw materials, by weight, 30 to 38% of organic silicon resin, 15 to 22% of hydroxy acrylic resin, 8 to 13% of polytetrafluoroethylene liquid resin, 3 to 8% of phosphorus silicon sodium zirconate, 0.5% of a fluorine carbon leveling auxiliary agent, and 30 to 40% of an organic solvent. Compared with the prior art, the multi-arc ion physical plating paint is capable of avoiding defects of conventional multi-arc ion plating; conventional chemical electroplating is completely replaced by physical multi-arc ion physical plating; and environmental protection is realized.

Description

technical field [0001] The invention relates to a coating, in particular to a multi-arc ion physical plating coating which replaces chemical electroplating. Background technique [0002] At present, chemical electroplating has been used in industry for a long time, but the environmental pollution is serious due to the discharge of three wastes in the electroplating process. With the development of vacuum technology, vacuum multi-arc ion plating using physical principles is bound to replace traditional chemical plating. Ion plating is in a vacuum chamber, using arc discharge and ionization of the evaporated substance, while the gas ions and the particles of the evaporated substance are bombarded, the evaporator is deposited on the substrate to form a coating film, which is characterized by high incident particle energy. It has the advantages of high film density and strong adhesion. The defect is that the film layer of ion plating should not be too thick, which will affect t...

AI Technical Summary

Problems solved by technology

Ion plating is in a vacuum chamber, using arc discharge and ionization of the evaporated material, while the gas ions and the particles of the evaporated material are bombarded, the evaporator is deposited on the substrate to form a coating film, which is characterized by high incident particle energy. It has the advantages of high film density and strong adhesion. The defect is that the film layer of ion plating should not be too thick. Too thick will affect the adhesion, so it restricts the process of multi-arc ion plating instead of electroless plating.