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1*2 high-efficiency reflection-type grating

A high-efficiency, reflective technology, applied in the field of reflective gratings, to achieve the effects of stable grating performance, easy processing and small etching depth

Active Publication Date: 2015-07-15
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

But as far as we know, so far, no one has provided a high-efficiency reflective grating for the TE polarization 1×2 beam splitting of the metal film dielectric grating made for the commonly used 1064 nm wavelength.

Method used

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  • 1*2 high-efficiency reflection-type grating

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Embodiment 1

[0015] The central wavelength of the present invention is a 1×2 high-efficiency reflective grating with a TE polarization of 1064 nanometers. Its structure is that a 20-nanometer chromium film 3, a 122-nanometer gold film 2 and a fused silica layer 1 are sequentially coated on a fused silica substrate 4. Layer 1 etches a rectangular groove grating, the unetched fused silica film layer is the connection layer, the grating period is 2304-2308 nm, the duty ratio is 0.34-0.36, the etching depth is 570-590 nm, and the thickness of the connection layer is It is 133-143 nanometers.

[0016] in such as figure 1 Under the grating structure shown, the present invention calculates the diffraction efficiency of a 1×2 high-efficiency reflective grating in the 1064 nanometer band by using the strict coupled wave theory [Prior Art 2].

[0017] Table 1 provides a series of embodiments of the present invention, in which d is the grating period, f is the grating duty cycle, and h 1 is the gra...

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Abstract

The invention provides a TE (transverse electric) polarized 1*2 high-efficiency reflection-type grating with central wavelength of 1,064 nanometers. The grating is structurally characterized in that a fused quartz substrate is sequentially coated with a chromium film, a gold film and a fused quartz film, a rectangular-groove grating is etched on the fused quartz film layer, the fused quartz film layer without being etched is a connection layer, the grating cycle is 2,304-2,308 nanometers, the duty ratio is 0.34-0.36, the grating depth is 570-590 nanometers, and the connection layer is 133-143 nanometers thick. When TE polarization light performs perpendicular incidence, zero-order elimination of the central wavelength of 1,064 nanometers can be realized, and the positive or negative one order diffraction efficiency is higher than 96%. The grating can be machined through a multi-beam laser parallel direct writing device in combination with a self-induction coupling plasma deep etching process and a film coating technique, materials are convenient to obtain, machining is simple, and the grating has important practical prospect.

Description

technical field [0001] The invention relates to a reflective grating, in particular to a 1×2 high-efficiency reflective grating with a central wavelength of 1064 nanometers and TE polarization. Background technique [0002] Beam splitters are the basic components in optical systems and have important applications in optical systems. High-efficiency reflective gratings are required in both pulse compression technology and femtosecond pulse splitting technology. Due to the shortcomings of traditional reflective beam-splitting gratings such as low diffraction efficiency, large loss, and difficult processing, the application of reflective gratings is limited. Fused silica is an ideal grating material, which has high optical quality, and metal-dielectric gratings processed by fused silica can achieve high diffraction efficiency. Shanghai Institute of Optics and Mechanics, Hu Anduo and others designed a broadband metal dielectric reflection grating when TE polarized light is inc...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/18
CPCG02B5/1861
Inventor 王津周常河麻健勇曹红超卢炎聪李民康项长铖
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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