1results about How to "Reduce etch depth" patented technology

This invention relates to the field of lenses, specifically to a position-modulable liquid crystal lens based on the principle of electric field superposition. The structure of this invention, from top to bottom, consists of an upper substrate, a liquid crystal layer, a dielectric layer, an electrode layer, and a lower substrate. The liquid crystal layer uses polymer-stabilized blue phase liquid crystal, and the electric field within it is a transverse electric field. According to the Kerr effect and related principles, it can achieve a larger refractive index difference. This invention achieves a transverse electric field in the liquid crystal layer through the principle of electric field superposition; that is, the transverse electric fields between pairs of electrodes are superimposed and enhanced, while the longitudinal electric fields are superimposed and canceled out. This allows for the realization of a transverse electric field in a liquid crystal lens with a single-layer planar electrode architecture, reducing the etching depth of the electrode structure. Furthermore, this invention modulates the sinusoidal driving voltage applied to the electrodes, achieving a transverse shift in the lens's refractive index distribution. The minimum precision of this transverse shift is the distance between two adjacent electrodes, thus enabling precise adjustment of the liquid crystal lens's position.