Sensor and lithographic apparatus

Abstract

A backside illuminated sensor comprising a supporting substrate, a semiconductor layer which comprises a photodiode comprising a region of n-doped semiconductor provided at a first surface of the semiconductor layer, and a region of p-doped semiconductor, wherein a depletion region is formed between the region of n-doped semiconductor and the region of p-doped semiconductor, and a layer of p-doping protective material provided on a second surface of the semiconductor layer, wherein the first surface of the semiconductor layer is fixed to a surface of the supporting substrate.

Description

[0001] Cross References to Related Applications [0002] This application claims the benefit of US Provisional Application 61 / 720,700, filed October 31, 2012, which is hereby incorporated by reference in its entirety. technical field [0003] The invention relates to sensors and lithographic apparatus. Background technique [0004] A lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. For example, lithographic equipment may be used in the manufacture of integrated circuits (ICs). In this case, a patterning device (alternatively referred to as a mask or reticle) may be used to create the circuit pattern to be formed on the individual layers of the IC. The pattern may be transferred onto a target portion (eg, comprising a portion of a die, one or several dies) on a substrate (eg, a silicon wafer). The transfer of the pattern is usually via imaging onto a layer of radiation sensitive material (...

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Problems solved by technology

While such high-temperature boron deposition techniques may be suitable for the fabrication of imaging sensors of simple construction, such as transmission imaging sensors, it has been found to

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