Electromagnetic shielding optical window making method
An electromagnetic shielding and manufacturing method technology, applied in the field of optical windows, can solve the problems of reducing the light transmission performance and electromagnetic shielding performance of the optical window, uneven distribution of high-order diffraction energy, reducing the light transmission performance of the optical window, etc., so as to achieve good electromagnetic shielding. performance, good light transmission performance, the effect of improving light transmission performance
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Example Embodiment
Specific embodiment one
[0039] The manufacturing method of the electromagnetic shielding optical window of this embodiment, the flowchart is as figure 1 As shown, the method includes the following steps:
[0040] Step a, firstly apply a masking liquid on the upper surface of the flat substrate 11, the masking liquid is crack nail polish containing water-based acrylic resin, and then uniformly coat the masking liquid on the surface of the substrate by spin coating , Form a mask layer film 12;
[0041] Step b, in a closed chamber, control the temperature of the chamber to be 20-25°C and the humidity to be 50-80%RH, and dry the mask layer film 12 naturally to form a crack template 13;
[0042] Step c, using magnetron sputtering or electron beam evaporation to deposit a conductive metal layer 14 on the surface of the crack template 13;
[0043] Step d, dissolving and removing the crack template 13 with a crack nail polish cleaner or a chloroform solution to obtain an electromagnetic shie...
Example Embodiment
Specific embodiment two
[0046] The manufacturing method of the electromagnetic shielding optical window of this embodiment, the method flow and the process flow are exactly the same as the specific embodiment 1, the difference is that the limited crack nail polish is diluted with a thinner, and the dilution ratio k is defined as the volume of the thinner and the crack nail polish Ratio, and 1≤k≤7.
[0047] Under the conditions of the above ratio, it is found that the relationship between the average crack width w of the crack template 13 and the thickness h of the mask layer film 12 is:
[0048] w=0.342e 0.266h
[0049] In the formula, w is the average crack width of the crack template 13 in the unit of μm; h is the thickness of the mask layer film 12 in the unit of μm.
[0050] The relationship between the average crack interval d of the crack template 13 and the thickness h of the mask layer film 12 is:
[0051] d=15.8e 0.169h
[0052] In the formula, d is the average crack interval ...
PUM
Property | Measurement | Unit |
---|---|---|
Thickness | aaaaa | aaaaa |
Thickness | aaaaa | aaaaa |
Thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap