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Coated glass with top-layer transparent electric-conduction protection film structure

A coated glass, transparent and conductive technology, used in glass/slag layered products, layered products, metal layered products, etc., can solve the problem that the thickness of the aluminum film cannot reach the micron level, the requirements of sputtering conditions are harsh, and the aluminum film is broken, etc. problems, to ensure decorative and optical properties, prevent scratches and scraps, and enhance weather resistance.

Inactive Publication Date: 2015-11-04
GEMCH MATERIAL TECH SUZHOU
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this method has strict requirements on sputtering conditions, and stress will inevitably be generated during the sputtering process, and the thickness of the aluminum film cannot reach the micron level, otherwise the aluminum film will crack during the anodic oxidation process due to excessive internal stress, limiting its further application

Method used

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  • Coated glass with top-layer transparent electric-conduction protection film structure
  • Coated glass with top-layer transparent electric-conduction protection film structure
  • Coated glass with top-layer transparent electric-conduction protection film structure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033] Embodiment 1: the Low-e film system single Ag film system structure of coated glass plating is as attached figure 2 As shown, there is a layer of Ag film 4 between the top protective film 1 and the glass substrate 5, and there are dielectric layers 2 and barrier layers 3 on the inside and outside of the Ag film 4 respectively, that is, the first dielectric layer 2 is in sequence under the top protective film 1. , a first barrier layer 3, an Ag film 4, a second barrier layer 3, a second dielectric layer 2 and a glass substrate 5.

[0034] In the foregoing, the dielectric layer 2 is SiNx / TiOx / SnO 2 / and other materials, the barrier layer 3 is NiCrOx / AZO.

Embodiment 2

[0035] Embodiment 2: the Low-e film system double Ag film system structure of coated glass plating is as attached image 3 As shown, there are two layers of Ag films 4 between the top protective film 1 and the glass substrate 5, and there are dielectric layers 2 and barrier layers 3 on the outside of each layer of Ag film 4, that is, the first dielectric layer under the top protective film 1. Layer 2, first barrier layer 3, first Ag film 4, second dielectric layer 2, second barrier layer 3, second Ag film 4, third barrier layer 3, third dielectric layer 2 and glass substrate 5.

Embodiment 3

[0036] Embodiment 3: TCO glass film system structure of coated glass as attached Figure 4 As shown, there is a TCO layer 6 and a dielectric layer 2 between the top protective film 1 and the glass substrate 5 , that is, the TCO layer 6 , the dielectric layer 2 and the glass substrate 5 are sequentially under the top protective film 1 .

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Abstract

The invention discloses coated glass with a top-layer transparent electric-conduction protection film structure. Target material arc light stable sputtering is adopted for a top-layer protection film (1), the voltage fluctuation of the sputtering process is smaller than 1 V, and the sputtering speed is (0.5-1.0) nm*m / min; a coating film layer serves as a protection film and has good wear resistance, and therefore scratching and scraping in the subsequent machining process of the coated glass are effectively prevented. Meanwhile, the coating film layer has good weather resistance, film sticking protection is not needed after the glass is coated with the film, and oxidation of the film layer does not occur when the glass is exposed in air for 30 days. The good bonding force between the coating film layer of a target material and an adjacent film layer is achieved, after the Low-E coated glass is toughened, film disengaging cannot occur, scratches do not exist, the wear resistance and the scratch-preventing performance of the glass coating film layer are improved, and the scrap rate of the coated glass in the deep processing process is obviously reduced; the wear resistance of the coated glass is improved, the coated glass passes through a salt spray test of 600 hours and is not oxidized after being toughened at a high temperature, and the stable decoration performance and optical performance of the coated glass are ensured.

Description

technical field [0001] The invention relates to the selection of IPC classification H01B dielectric material or C23C coating structure improvement technology for metal materials, especially the coating glass with top layer transparent conductive protective film structure. Background technique [0002] The fields of sputtering coating with target materials include: low-emissivity (Low-E) glass, anti-reflection (AR) glass and transparent conductive (TCO) glass. Low-emissivity glass is also called Low-E glass, and Low-E is the abbreviation of English Low-Emissivity. The coated glass is mainly used in building doors and windows, curtain wall glass and automobile windshield. It not only maintains good visible light transmittance, but also can effectively reduce infrared heat radiation, and has the effects of beauty, environmental protection and energy saving. The offline Low-E coated glass produced by the vacuum magnetron sputtering method can obtain a variety of photothermal pr...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B32B17/06B32B15/04C03C17/36
CPCB32B17/06B32B15/04C03C17/3602
Inventor 温艳玲黄小军诸斌庄志杰
Owner GEMCH MATERIAL TECH SUZHOU