Iron nitride permanent magnet and technique for forming iron nitride permanent magnet
A technology of iron nitride and iron nitride, which is applied in the direction of magnetic objects, magnetic materials, transportation and packaging, etc., can solve the problems of expensive permanent magnet manufacturing, high magnet manufacturing cost, price supply shortage, etc.
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Embodiment 1
[0265] Figure 19 This is a graph showing the Auger measurement of the change in N+ ion concentration with depth in the iron foil after ion implantation and before annealing the iron nitride foil. Between N+ ion implantation, the iron foil has a thickness of about 500 nm. N+ ions are accelerated to 100 keV to be implanted into the iron film. Use about 8x10 16 / cm 2 The N+ ion fluence of N+ ions implants N+ ions into the iron foil. Use Auger Electron Spectroscopy (AES) Use the Physical Electronics Industry (PHI) 545 Scanning Auger Microprobe available from Physical Electronics, Inc., Chanhassen, Minnesota to use Ar in the milling source + Perform the measurement. Such as figure 2 As predicted by the relationship shown in, the peak position of the N+ ion concentration is approximately Or 100nm. In addition, N+ ion implantation Other depths nearby.
Embodiment 2
[0267] Picture 20 In order to show the scatter plot of nitrogen concentration with depth in iron foil annealed after different nitrogen fluency. Before N+ ion implantation, the iron foil has a thickness of about 500 nm. N+ ions are accelerated to 100 keV to be implanted into the iron foil. Use about 2x10 16 / cm 2 , 5x10 16 / cm 2 , 8x10 16 / cm 2 And 1x10 17 / cm 2 The fluence of N+ ions injects N+ ions into the iron foil. After the ion implantation, the iron nitride foil was attached to the (111) silicon substrate and heated at 4%H 2 +10%N 2 It is pre-annealed at about 500°C for about 0.5 hours in a +86% Ar atmosphere. The iron nitride foil is then subjected to a post-annealing treatment in vacuum at about 150°C for about 40 hours.
[0268] Such as Picture 20 As shown, the thickness of the iron nitride foil after the post-annealing step is about 450 nm. It is believed that the 50nm thickness loss is due to the loss of iron during ion bombardment and the cleaning during the pos...
Embodiment 3
[0270] Figure 21A with Figure 21B This is the hysteresis loop of magnetization versus coercive force of the iron nitride foil prepared by ion implantation. Before N+ ion implantation, the iron foil has a thickness of about 500 nm. N+ ions are accelerated to 100 keV to be implanted into the iron film. Use about 8x10 16 / cm 2 The N+ ion fluence of N+ ions implants N+ ions into the iron foil. After the ion implantation, the iron nitride foil was attached to the (111) silicon substrate and heated at 4%H 2 +10%N 2 It is subjected to pre-annealing treatment at about 500°C for about 0.5 hours in a +86% Ar atmosphere. The iron nitride foil is then subjected to a post-anneal treatment at about 150° C. for about 40 hours in a vacuum.
[0271] Figure 21A Shows the hysteresis loop of the iron nitride foil at a temperature of about 5K. Such as Figure 21A As shown in, the pre-annealing treatment and post-annealing treatment introduce an increase in saturation magnetization from about 2....
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Abstract
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