Multistage Magnetic Field Arc Ion Plating Method with Adjustable Transmission Direction

Abstract

The invention relates to a multilevel magnetic field arc ion plating method with adjustable transmission directions and belongs to the technical field of the material surface treatment. According to the multilevel magnetic field arc ion plating method with the adjustable transmission directions, the large particle problem occurring in the arc ion plating process of pure metal with low-melting-point or multi-component alloy materials and non-metallic materials (such as graphite) is solved; the using limitation of target materials with the low-melting-point is broken; the usable range of arc ion plating target materials and the field of thin film preparation are expanded. The multilevel magnetic field arc ion plating method comprises the steps that 1 a workpiece to be coated with a film is placed on a sample stage in a vacuum chamber and related power sources are connected; and 2 thin film deposition is conducted, when the vacuum degree in the vacuum chamber is less than 10-2 Pa, working gases are pumped in and the air pressure is adjusted, a film plating power source, namely, a grid bias power source is started, a multilevel magnetic field straight pipe magnetic filtration device removes the defect of large particles and guarantees the transmission efficiency of arc plasma, and then the magnetic field device with the adjustable transmission directions is used for guaranteeing the arc plasma to reach substrate surfaces of optional positions in the vacuum chamber and sets up needed technological parameters to make the thin film to deposit.

Description

technical field [0001] The invention relates to a multi-stage magnetic field arc ion plating method with adjustable transmission direction, and belongs to the technical field of material surface treatment. Background technique [0002] Arc ion plating technology can obtain almost all metal ions including carbon ions. At the same time, it has the advantages of high ionization rate, good diffraction, good film-substrate bonding force, good coating quality, high deposition efficiency and easy operation of equipment. Attention is paid to it, and it is one of the physical vapor deposition preparation technologies widely used in industry at present. It can not only be used to prepare metal protective coatings, but also realize the preparation of high-temperature ceramic coatings such as nitrides and carbides through the adjustment of process methods, and it is also used in the field of functional thin films. Arc ion plating can achieve rapid deposition of films even for parts wit...

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Problems solved by technology

[0004] The purpose of the present invention is to solve the problem that the traditional arc ion plating method is easy to produce large particle defects, the magnetic filter technology causes arc plasma transmission efficiency is low, and the use of low melting point pure metal or multi-element alloy materials and non-metallic materials (such as graphite) as target materials In the traditional arc ion plating method, the large particles contained in the arc plasma are eliminated by the multi-stage magnetic field straight tube magnetic filtration method, and at the same time, the arc plasma is guaranteed to pass through the straight tube filter device with high transmission efficiency, and then Using the magnetic field device with adjustable transmission direction, the surface of the substrate workpiece at any position in the coating space can be continuously and densely prepared with high-quality films under the condition of applying a negative bias voltage, so as to realize the control of element content in the film and reduce the production cost of using alloy targets. Improve the deposition efficiency of the film, reduce the adverse effects of discharge instability and large particle defects on the growth and performance of the film, and propose a multi-stage magnetic field arc ion plating method with adjustable transmission direction

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