Multi-level magnetic field arc ion plating method based on lined straight pipe and porous baffle

Abstract

The invention relates to a lining straight pipe and porous baffle compound type multistage magnetic field arc ion plating method, and belongs to the technical field of material surface treatment. The problems of pollution of large particles and deposition ions in a multistage magnetic field filtering device to pipe inner walls and losses of arc plasmas in the transporting process are solved. The method includes the steps that (1) workpieces to be subject to film coating are placed on a sampling table in a vacuum chamber, a related power source is on, and an external water cooling system is started; (2) thin film deposition is carried out, wherein after the vacuum degree in the vacuum chamber is smaller than 10<-4> Pa, working gas is led in, the air pressure is adjusted, a film coating power source is started, meanwhile, a grid bias power source is used for attracting the arc plasmas at the an outlet and conducting energy adjustment, through stopping shield of the self shape and the structure combination of a lining positive bias straight pipe and porous baffle compound type device, the restraining effect of a positive bias electric field and a filtering effect of a multistage magnetic field, large particles defects are effectively eliminated, the transmission efficiency of the arc plasmas is guaranteed, the technological parameter is set, and thin film preparing is carried out.

Description

technical field [0001] The invention relates to a composite multistage magnetic field arc ion plating method of a lined straight pipe and a porous baffle, and belongs to the technical field of material surface treatment. Background technique [0002] In the process of preparing thin films by arc ion plating, due to the arc spot current density as high as 2.5~5×10 10 A / m 2 , causing molten liquid metal to appear at the arc spot position on the target surface, which is splashed out in the form of droplets under the action of local plasma pressure, and adheres to the surface of the film or is embedded in the film to form "macroparticles" (Macroparticles) Defects (BoxmanR L, Goldsmith S. Macroparticle contamination in cathodic arc coatings: generation, transport and control [J]. Surf Coat Tech, 1992, 52(1): 39-50.). In the arc plasma, since the movement speed of electrons is much greater than that of ions, the number of electrons reaching the surface of large particles per uni...

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Problems solved by technology

[0004] The purpose of the present invention is to solve the traditional arc ion plating method using low-melting point pure metal or multi-element alloy material and non-metallic material (such as graphite) as the target material, which is easy to produce large particle defects, and the arc plasma transmission efficiency caused by the curved magnetic filter technology. Low-level problems, combined with the multi-stage magnetic field filtering method and the combination of the shape and structure of the lined positive bias straight tube and porous baffle composite device, the mechanical barrier shielding and the composite effect of positive bias electric field attraction, while ensuring arc plasma The body passes through a multi-stage magnetic field filter device and a composite device lined with a positive bias straight tube and a porous baffle with high transmission efficiency, so that the surface of the workpiece can be continuously and densely prepared with high-quality films when a negative bias is applied, and at the same time realize To control the addition of elements in the film, reduce the production cost of using alloy targets, improve the deposition efficiency of the film, and reduce the adverse effects of large particle defects on the growth and performance of the film, a multi-stage composite type of lined straight tube and porous baffle is proposed. Magnetic field arc ion plating method

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