Method for regulating electronic band gap in SiC-based epitaxial graphene

An electronic bandgap and graphene technology, applied in chemical instruments and methods, crystal growth, post-processing details, etc., can solve problems such as raising injection costs, limiting application value, and not explaining the controllability of electronic bandgap, etc., to achieve The effect of overcoming poor controllability and repeatability

Inactive Publication Date: 2015-11-25
SHANDONG JIANZHU UNIV
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Problems solved by technology

This invention has the following disadvantages: the type of implanted ions is limited to P ions, which requires the use of a dedicated ion source, which increases the c...

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Embodiment Construction

[0020] The present invention will be further explained below.

[0021] A method for adjusting the electronic band gap of SiC-based epitaxial graphene includes the following steps in sequence: a) Prepare an epitaxial graphene sample, calculate ion damage distribution, electron energy loss and nuclear energy loss distribution in SiC crystal through SRIM software, radiation The ion type is a light ion of H or He and an intermediate mass ion with an atomic weight of 6-40. The light ion energy is 25keV~500keV, and the dose is , The intermediate mass ion energy is 500keV~6MeV, the dose is Calculate the band structure of defective graphene through first principles. The purpose is to apply theoretical simulation software SRIM to simulate the interaction between ions and solids to calculate the band structure of graphene and provide a theoretical basis for the subsequent steps.

[0022] b) Irradiate the SiC-based epitaxial graphene sample with an ion beam. The irradiated ions pass through...

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Abstract

The invention discloses a method for regulating an electronic band gap in SiC-based epitaxial graphene. The method comprises the following steps of (a) calculating the damage distribution as well as electronic and nuclear energy loss distribution of irradiation ions in SiC crystals through SRIM software, and calculating an energy band structure of defected graphene; (b) irradiating an SiC-based epitaxial graphene sample by using an ion beam to form epitaxial graphene with the defected structure; (c) respectively observing metallographic structures of irradiated and non-irradiated graphene by using a metallographic microscope, and observing the surface folding changes of the irradiated and non-irradiated graphene by using a scanning electron microscope; (d) calculating the lattice defect amount of the graphene sample under different irradiation conditions through the formula as shown in the specification; and (e) testing the band gap in the epitaxial graphene by virtue of an infrared spectrum to achieve the aim of regulating the band gap. A controllable defected structure is generated in the graphene by using an ion irradiation method, furthermore, the electronic band gap in the graphene is regulated, and therefore, the defects of poor controllability and repeatability in the traditional process are overcome.

Description

Technical field [0001] The invention relates to a method for regulating the electronic band gap of SiC-based epitaxial graphene. Background technique [0002] Graphene is a single-layer carbon atom film, which is a typical two-dimensional crystal material. Because of its superior physical and chemical properties, its research field has penetrated into electronic devices, sensors, energy storage, modulators, etc. Because graphene has a unique electronic structure near the Dirac point, it has many unique properties. Some scientists boldly predict that graphene will eventually replace silicon as the material of choice in the field of electronic information. However, its zero electronic band gap has severely restricted its application range. Therefore, opening and regulating the electronic band gap of graphene is a key issue that determines whether it can be successfully applied in the field of electronic information. At present, the research on regulating the energy gap of graphe...

Claims

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Application Information

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IPC IPC(8): C30B33/02C30B33/04
Inventor 赵金花秦希峰王凤翔付刚
Owner SHANDONG JIANZHU UNIV
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