Method for stabilizing the initial state of nozzle-type mocvd, chlorine-resistant double-layer nozzle and its manufacturing method
An initial state and nozzle technology, applied in chemical instruments and methods, coatings, gaseous chemical plating, etc., can solve problems such as increased chlorine corrosion and difficulty in nozzle cleaning
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Embodiment 1
[0052] Embodiment 1: The method for stabilizing the initial state of the near-coupled nozzle type MOCVD reaction tube and the chlorine-resistant double-layer nozzle and its production method
[0053] A method for stabilizing the initial state of a close-coupled nozzle-type MOCVD reaction tube is as follows (taking manual operation as an example):
[0054] A. After completing a furnace of epitaxial growth each time, open the reaction tube, that is, the lower flange 16 of the nozzle is disengaged from the reaction tube flange 17, and take out the graphite disk 24 filled with the epitaxial substrate 6 with randomly configured calipers;
[0055] B. Replace the "dirty" graphite disc 24 that was not cleaned in the previous furnace; place a porous heat conducting plate 5 on the surface of the "dirty" graphite disc 24. In this embodiment, the material of the plate is graphite, and chlorine can pass through multiple holes Diffusion to the surface of the graphite disc 24, thereby ensuri...
Embodiment 2
[0067] The structure of embodiment 2 is basically the same as that of embodiment 1, the difference lies in:
[0068] A method for stabilizing the initial state of a close-coupled nozzle-type MOCVD reaction tube, using a manipulator to operate:
[0069] (1) After each batch of epitaxial growth is completed, the manipulator takes out the graphite disk 24 filled with the epitaxial substrate 6;
[0070] (2) The manipulator is replaced with the "dirty" graphite disk 24 that has not been cleaned from the previous furnace, and the porous heat conducting plate 5 of the graphite disk has been placed on the surface;
[0071] (3) Charge dry hydrogen chloride with a concentration of 5% from the chlorine channel 7 into the reaction tube for online cleaning. The total charge depends on the molar concentration of chlorine, the thickness and area of the deposited layer, and of course the cleaning temperature to achieve clean But slightly over the head shall prevail; the temperature of grap...
Embodiment 3
[0075] The structure of embodiment 3 is basically the same as that of embodiment 1, the difference lies in:
[0076] Before chlorine filling and cleaning, the porous heat conduction plate 5 is canceled; at this time, the working principle is to directly shorten the distance between the graphite disc base 24 and the lower surface of the nozzle main body 4 by mechanical means, and reset it to the lower surface by mechanical means after cleaning. growth state;
[0077] The welding between the partition plate 12 between the III group source and the V group source and the many square small columns in the V group source chamber 2 adopts brazing, because these brazing materials do not directly contact with chlorine, so brazing is allowed; The slit 32 is selected to be located on the lower surface opening of the shower head body 4 processed by EDM. At this time, the advantage is that the argon arc welding method is used to block these slits without being hindered by many small square ...
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