Succinimide cyanogen-free monovalent copper plating electroplating liquid and electroplating method thereof
A succinimide and electroplating solution technology, applied in electrodes, electrolysis process, electrolysis components, etc., can solve the problems of poor coating quality and unsatisfactory bath performance, and achieve good coating quality, excellent bath performance, and porosity. low rate effect
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Embodiment 1
[0036] The formulation of the electroplating solution is as follows:
[0037]
[0038]
[0039]Plating process conditions: the pulse width of single pulse square wave current is 0.4ms, the duty cycle is 30%, and the average current density is 0.5A / dm 2 ; The pH is 8, the temperature is 55°C, and the electroplating time is 40min.
Embodiment 2
[0041] The formulation of the electroplating solution is as follows:
[0042]
[0043] Plating process conditions: the pulse width of single pulse square wave current is 0.5ms, the duty cycle is 25%, and the average current density is 0.7A / dm 2 ; The pH is 8.5, the temperature is 50°C, and the electroplating time is 30min.
Embodiment 3
[0045] The formulation of the electroplating solution is as follows:
[0046]
[0047] Plating process conditions: the pulse width of single pulse square wave current is 0.7ms, the duty cycle is 20%, and the average current density is 0.9A / dm 2 ; The pH is 9, the temperature is 45° C., and the electroplating time is 20 minutes.
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