Optical pumping nitride echo wall laser performing emission in single direction and preparation method thereof
A nitride and laser technology, applied in the laser field, can solve the problem of no laser direction output, achieve controllable etching rate, high precision, and reduce bending loss
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[0020] The present invention will be described in further detail below in conjunction with the accompanying drawings and specific embodiments.
[0021] Taking the preparation of an optically pumped gallium nitride microlaser emitting in one direction with a diameter of 10 microns as an example, the preparation process is as follows:
[0022] Step 1: The purchased commercial GaN wafer on silicon substrate is ultrasonically cleaned with acetone, absolute ethanol and deionized water in sequence, and then blown dry with nitrogen gas; A silicon dioxide thin film layer 1 with a thickness of 1 micron is evaporated on the surface.
[0023] Step 2: After ultrasonically cleaning the silicon-based gallium nitride wafer with the evaporated silicon dioxide layer in sequence with acetone, absolute ethanol and deionized water, blow it dry with nitrogen gas; The upper surface of the silicon layer 2) was spin-coated with photoresist AZ5214 at a speed of 4000 rpm, and the spin coating time was...
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