A kind of perovskite mica photovoltaic material and preparation method thereof
A photovoltaic material and perovskite technology, applied in photovoltaic power generation, semiconductor/solid-state device manufacturing, electrical components, etc., can solve the problems of low light absorption by the perovskite absorber layer and low photoelectric conversion rate of solar cells, etc. To achieve the effects of excellent crystal form, improved transmission speed, and strong electrical insulation
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Embodiment 1
[0029] (1) Preparation of TiO 2 dense layer
[0030] Screen printing a layer of TiO on FTO glass 2 Thin film layer, after heating at 450°C for 30 minutes, a dense layer with a thickness of 50nm is obtained;
[0031] (2) Preparation of nano mica powder
[0032] The mica particles were vacuum-dried, the drying temperature was 105°C, and the drying time was 25h. The dried mica was ground and pulverized in a high-speed pulverizer for 7 hours. Finally, 400nm nanoscale mica particles are obtained;
[0033] (3) Preparation of nano-mica mesoporous layer
[0034] The mica particles obtained in step (2) and isopropanol were made into a slurry at a weight ratio of 1:3.5, spin-coated onto the dense layer obtained in step (1), dried at 100°C, and then transferred to a muffle furnace for Perform annealing treatment for 30 minutes at a temperature of 350°C to obtain a nano-mica mesoporous layer attached to the dense layer;
[0035] (4) Preparation of perovskite-mica photovoltaic mater...
Embodiment 2
[0039] Step (1) is the same as above;
[0040] (2) Preparation of nano mica powder
[0041] The mica particles were vacuum-dried, the drying temperature was 100°C, and the drying time was 25h. The dried mica was ground and pulverized in a high-speed pulverizer for 6 hours. Finally, 450nm nanoscale mica particles are obtained;
[0042] (3) Preparation of nano-mica mesoporous layer
[0043]The mica particles obtained in step (2) and isopropanol were made into a slurry at a weight ratio of 1:3.2, spin-coated onto the dense layer obtained in step (1), dried at 100°C, and then transferred to a muffle furnace for Perform annealing treatment for 30 minutes at a temperature of 350°C to obtain a nano-mica mesoporous layer attached to the dense layer;
[0044] (4) Preparation of perovskite-mica photovoltaic materials
[0045] Spin-coat the nano-mica mesoporous layer obtained in step (3) with a concentration of 1.0mol / L lead iodide, lead chloride or lead bromide solution, and then ...
Embodiment 3
[0048] Step (1) is the same as above;
[0049] (2) Preparation of nano mica powder
[0050] The mica particles were vacuum-dried, the drying temperature was 80°C, and the drying time was 30h. The dried mica was ground and pulverized in a high-speed pulverizer for 8 hours. Finally, 300nm nanoscale mica particles are obtained;
[0051] (3) Preparation of nano-mica mesoporous layer
[0052] The mica particles obtained in step (2) and isopropanol were made into a slurry at a weight ratio of 1:4, spin-coated onto the dense layer obtained in step (1), dried at 200°C, and then transferred to a muffle furnace for Annealing for 60 minutes at a temperature of 600°C to obtain a nano-mica mesoporous layer attached to the dense layer;
[0053] (4) Preparation of perovskite-mica photovoltaic materials
[0054] Spin-coat the nano-mica mesoporous layer obtained in step (3) with a concentration of 1.2mol / L lead iodide, lead chloride or lead bromide solution, and then 3 NH 3 After soakin...
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