Touch panel
A touch panel, transparent technology, applied to electronic equipment, conductive layers on insulating carriers, applications, etc., can solve problems such as the stability of transparent electrodes, and achieve the effect of excellent operation stability and durability
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Embodiment 1
[0071] Made with figure 1 The touch panel 10 constituted by the same layer. PET (125 μm) was used as the transparent resin substrate 1 , and a UV curable transparent acrylic resin was microgravure coated on one side as the resin layer 2 , dried and UV cured to form a thickness of 3 μm. Silver nanowires were coated as a transparent conductive film 3 on the surface of the substrate opposite to the side of the resin layer 2 using a slot die coating method so that the surface resistance reached 100 Ω / □, and UV-curable transparent acrylic resin was similarly coated to a thickness of 130 mm. As cured film 4. The transparent conductive film 3 was patterned as an upper electrode by exposing and developing the obtained base material with a transparent conductive film using a photoresist by photolithography, and then performing etching and resist stripping. .
[0072] Next, using PET (125 μm) as another transparent resin substrate 1 , SiOx / (a polycondensation film of tetraethoxysilan...
Embodiment 2
[0076] Made with figure 2 The touch panel 20 is composed of the same layer. PET (188 μm) was used as the transparent resin substrate 1 , and a UV curable transparent acrylic resin was microgravure coated on one side as the resin layer 2 , dried and UV cured to form a thickness of 5 μm. 25wt% of UV absorbers were added to the resin layer 2 so that the UV transmittance at a wavelength of 365nm would be 0.9%. In addition, SiOx / (a polycondensation film of tetraethoxysilane and polyvinyl alcohol) was formed as the water vapor barrier layer 7 on the opposite face. A polyester resin was previously applied to the lower layer of SiOx by a bar coating method, and dried and cured at 80° C. for 1 minute to form a film of 100 nm. The SiOx layer is a vacuum evaporation device using an electron beam heating method. The silicon oxide material (SiO) is evaporated by electron beam heating. The pressure in the film formation is 1.5×10 -2 A film was formed with a cured film thickness of 40 nm...
Embodiment 3
[0081] Made with image 3 The touch panel 30 is composed of the same layer. PET (125 μm) was used as the transparent resin substrate 1, and a UV-curable transparent acrylic resin added with 20 wt % of UV absorber was microgravure-coated on both sides as the resin layer 2, and then dried and UV-cured to achieve a thickness of 5 μm. thickness formed. Furthermore, a UV-curable acrylic resin with zirconia particles was formed as an optical adjustment layer 8 in a thickness of 90 nm on both surfaces. At this time, the refractive index of the optical adjustment layer 8 was 1.70. The obtained substrate was further formed with a thickness of 22 nm by DC magnetron sputtering as a transparent conductive film 3 by DC magnetron sputtering on both sides, and annealed at 150° C. for 60 minutes to form a single The surface resistance of the surface was obtained at 150 Ω / □. In the same manner as in Example 2, the obtained substrate with a transparent conductive film on both sides was expo...
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Abstract
Description
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