Display or illumination device, and method for forming insulating film

A technology of lighting device and insulating film, which is applied in the direction of lighting device, photoengraving process of pattern surface, instruments, etc., to achieve the effect of suppressing light degradation

Inactive Publication Date: 2016-08-17
JSR CORPORATIOON
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, most insulating films currently used are transparent in the wavelength region of 300 nm to 400 nm, for example, and are required to provide light-shielding properties.

Method used

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  • Display or illumination device, and method for forming insulating film
  • Display or illumination device, and method for forming insulating film
  • Display or illumination device, and method for forming insulating film

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0408] [Preparation method of radiation-sensitive material]

[0409] The radiation-sensitive material can be prepared by mixing essential components such as a polymer (A), a photosensitizer (B), and a resin (C) and other optional components in a solvent (E), for example. Moreover, after mixing each component uniformly, you may filter the obtained mixture with a filter etc. in order to remove a foreign substance.

[0410] [Formation method of insulating film using radiation-sensitive material]

[0411] The method for forming the insulating film of the display or lighting device of the present invention comprises the following steps: step 1, using the radiation-sensitive material to form a coating film on the substrate; step 2, irradiating radiation to at least a part of the coating film; Step 3, developing the coating film irradiated with radiation; and Step 4, heating the developed coating film.

[0412] According to the method of forming the insulating film, an insulating f...

Embodiment

[0454] Hereinafter, although an Example demonstrates this invention more concretely, this invention is not limited to these Examples. In descriptions such as the following examples, "parts" are "parts by mass" unless otherwise mentioned.

[0455] [GPC Analysis]

[0456] The weight average molecular weight (Mw) and molecular weight distribution (Mw / Mn) of a polymer (A) and resin (C) were measured by the gel permeation chromatography (GPC) method under the following conditions.

[0457] ・Standard material: polystyrene conversion

[0458] ・Device: manufactured by Tosoh Co., Ltd., trade name: HLC-8020

[0459] ・Column: guard column (guard column) H manufactured by Tosoh Co., Ltd. XL -H, TSK gelG7000H XL 、TSK gel GMH XL 2 sticks, TSK gel G2000H XL connected in sequence

[0460] Solvent: Tetrahydrofuran

[0461] ・Sample concentration: 0.7% by mass

[0462] ·Injection volume: 70μL

[0463] ·Flow rate: 1mL / min

[0464] [NMR analysis]

[0465] The phenyl group content in p...

Synthetic example A1

[0467] [Synthesis Example A1] Synthesis of Polymer (A-1) (Polyimide)

[0468] After adding 390 g of γ-butyrolactone as a polymerization solvent to the three-necked flask, 120 g of 2,2′-bis(3-amino-4-hydroxyphenyl)hexafluoropropane as a diamine compound was added to the polymerization solvent. After dissolving the diamine compound in the polymerization solvent, 71 g of 4,4'-oxydiphthalic dianhydride was added as an acid dianhydride. Then, after reacting at 60 degreeC for 1 hour, 19 g of maleic anhydrides were added as a terminal blocking agent, and after reacting further at 60 degreeC for 1 hour, it heated up and reacted at 180 degreeC for 4 hours. About 600 g of the polyimide solution whose solid content concentration containing a polymer (A-1) was about 35 mass % was obtained. The Mw of the obtained polymer (A-1) was 8000.

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Abstract

The invention provides a display or illumination device that has a thin-film transistor as a driving element, the thin film transistor including a semiconductor layer comprising a highly optically degradable substance, wherein a reduction is achieved in the optical degradation that occurs in the substance and accompanies the use of the display or illumination device. A display or illumination device includes a TFT substrate, a first electrode, an insulating film, and a second electrode. The first electrode is provided on the TFT substrate and is connected to the TFT. The insulating film is formed on the first electrode so as to allow the first electrode to be partially exposed and has a total light transmittance in a range of 0-15% at a wavelength of 300-400 nm. The second electrode is provided so as to face the first electrode. The display or illumination device is such that: the insulating film is formed from a radiation-sensitive material; the radiation-sensitive material includes (A) a polymer, (B) a photosensitizer, and (C) a resin such as a novolac resin; and the content of resin (C) in the radiation-sensitive material is 2-200 parts by mass in relation to 100 parts by mass of polymer (A).

Description

technical field [0001] The invention relates to a display or lighting device and a method for forming an insulating film. More specifically, the present invention relates to a substrate having a substrate, a first electrode provided on the substrate, an insulating film formed on the first electrode so that the first electrode is partially exposed, and a substrate facing the first electrode. A display or lighting device provided with a second electrode and a method of forming the insulating film. Background technique [0002] As a flat panel display (flat panel display), a non-luminous liquid crystal display (Liquid Crystal Display, LCD) is becoming more and more popular. In addition, in recent years, electroluminescent displays (Electroluminescent Displays, ELDs), which are self-luminous displays, have become known. In particular, an organic electroluminescence (EL) element utilizing electroluminescence of an organic compound is expected not only as a light-emitting elemen...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H05B33/22G03F7/023H01L51/50H05B33/12
CPCH01L27/1225G03F7/0233G03F7/0236G03F7/039H10K59/126H10K59/122G03F7/004G03F7/023G03F7/26H10K59/123H10K59/1213
Inventor 工藤和生安田博幸山村哲也胜井宏充宫迫毅明
Owner JSR CORPORATIOON
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