Method for preparing copper-indium-gallium-selenide photoelectric thin film from copper nitrate and gallium chloride
A copper indium gallium selenide, photoelectric thin film technology, applied in photovoltaic power generation, circuits, electrical components and other directions, can solve the problems of high preparation cost, complex process route, low cost, etc., and achieves low production cost, low equipment requirements, and low cost low effect
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[0036] a. Cleaning of the glass substrate: clean the glass substrate as described above, and the size of the substrate is 20mm×20mm.
[0037] b. Put 1.5 parts of copper nitrate, 1.0 parts of indium chloride, 1.0 parts of gallium chloride and 2.0 parts of selenium dioxide into 378.07 parts of deionized water and mix evenly, and use ultrasonic vibration for more than 30 minutes to make the substances in the solution evenly mixed.
[0038] c. Drop the above solution onto the glass substrate placed on the homogenizer, then start the homogenizer, rotate the homogenizer at 300 rpm for 5 seconds, and rotate at 3000 rpm for 15 seconds, so that the dripped solution is coated After uniformity, the substrate was dried at 100°C, and then the above-mentioned solution was dripped and spin-coated again, and then dried again. This was repeated 10 times, and a precursor thin film sample with a certain thickness was obtained on the glass substrate.
[0039] d. Put the precursor thin film sample...
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