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Silica particle, resin composition containing same and use thereof

A technology of resin composition and silica, applied in the directions of silica, silica, semiconductor/solid-state device parts, etc., can solve the problems of insufficient improvement of resin affinity and unstable surface characteristics of silica particles. , to achieve the effect of improving the surface properties

Active Publication Date: 2020-03-27
NIPPON SHOKUBAI CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In addition, the surface properties of silica particles subjected to uneven surface treatment are not stable, and there is a problem that the affinity with resin cannot be sufficiently improved.

Method used

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  • Silica particle, resin composition containing same and use thereof
  • Silica particle, resin composition containing same and use thereof
  • Silica particle, resin composition containing same and use thereof

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0102] The above-mentioned step (1) of preparing silica particles (hereinafter also referred to as the step of preparing silica particles) will be described. This step is preferably a step of preparing silica particles by hydrolyzing and condensing alkoxysilane in an organic solvent in the presence of a basic catalyst and water.

[0103]As the alkoxysilane, for example, tetraalkoxysilane such as tetramethoxysilane, tetraethoxysilane, tetraisopropoxysilane, tetrabutoxysilane, dimethoxydiethoxysilane, etc. Silanes, alkyltrialkoxysilanes such as methyltrimethoxysilane and methyltriethoxysilane, dialkyldioxanes such as dimethyldimethoxysilane and dimethyldiethoxysilane Trialkylalkoxysilane such as trimethylmethoxysilane, trimethylethoxysilane, 3-chloropropylmethyldimethoxysilane, 3-chloropropyltrimethoxysilane Alkoxysilanes containing chloroalkyl groups such as silane, alkoxysilanes containing vinyl groups such as vinyltrimethoxysilane and vinyltriethoxysilane, phenyltrimethoxysi...

Embodiment 1

[0150] 67.54 kg of methanol and 24.30 kg of 28% by mass ammonia water (water and catalyst) were added to a 200-L reactor equipped with a stirrer, a dropping device, and a thermometer, and the liquid temperature was adjusted to 40±0.5° C. while stirring. On the other hand, a solution obtained by dissolving 10.76 kg of tetramethoxysilane in 4.61 kg of methanol was added to the dropping device. While maintaining the temperature of the liquid in the reactor at 40±0.5°C, the solution was dripped from the dropping device for 1 hour, and after the completion of the dropping, the temperature of the liquid was maintained at the temperature and stirred for the next 1 hour. Hydrolysis and condensation of tetramethoxysilane yields a dispersion containing a precursor of silica particles.

[0151] The dispersion liquid was air-dried by a momentary vacuum evaporator to obtain dry silica particles. As the instant vacuum evaporation apparatus, Crux-system 8B type (manufactured by Hosokawa Mic...

Embodiment 2

[0155] 67.54 kg of methanol and 26.33 kg of 28% by mass ammonia water (water and catalyst) were added to a 200-L capacity reactor equipped with a stirrer, a dropping device, and a thermometer, and the liquid temperature was adjusted to 33±0.5° C. while stirring. On the other hand, a solution obtained by dissolving 13.45 kg of tetraethoxysilane in 5.59 kg of methanol was added to the dropping device. While keeping the liquid temperature in the reactor at 33±0.5°C, the solution was dripped from the dropping device for 1 hour, and after the completion of the dropping, the liquid temperature was maintained at the temperature and stirred for the next 1 hour. Hydrolysis and condensation of tetraethoxysilane yields a dispersion containing a precursor of silica particles. Subsequent operations were performed in the same manner as in Example 1 to obtain calcined silica particles.

[0156] The obtained calcined silica particles (specific surface area 12m 2 / g) 5 kg was added to a Hens...

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Abstract

The present invention provides silica particles that have been uniformly surface-treated with a silicon compound to improve surface properties and affinity with resins. The silica particles of the present invention are surface-treated with a specific silicon compound, and have a C / Si ratio of 0.05 or more in X-ray photoelectron spectroscopy (XPS).

Description

technical field [0001] The present invention relates to silica particles surface-treated with a silicon compound. Background technique [0002] Inorganic fine particles are used in various fields due to their excellent strength and heat resistance. In particular, silica particles can be used in the following materials, such as anti-blocking agents or slippery imparting agents for various films such as polyester films, polyimide films, and fluororesin films; used in elements for liquid crystal displays Gaskets for flat surfaces, gaskets for sealing parts of liquid crystal display elements, gaskets for EL display elements, gaskets for touch panels, spacers for gaps between various substrates such as ceramics and plastics, etc.; semiconductor sealing materials Sealing materials for various electronic devices such as sealing materials for liquid crystals, sealing materials for LED light-emitting elements, etc.; light diffusing agents used in light diffusing films, light diffusi...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01B33/18C08K9/06C08L101/00H01L23/29H01L23/31
CPCC08K9/06H01L33/56C01P2002/85C01P2004/61C01P2004/62C01P2004/64H01L23/295C09C1/3081C08K3/36H01L23/298C08K2201/005
Inventor 小野勇二大石英树芝崎将一
Owner NIPPON SHOKUBAI CO LTD