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Layered frozen fixed abrasive polishing pad and preparation method thereof

A technology of fixed abrasive and layered freezing, used in grinding/polishing equipment, abrasives, grinding devices, etc., can solve the problems of low removal rate, low precision, and change of processing positioning benchmarks, achieving simple preparation and improved processing. Efficiency and effect of preventing thermal stress

Active Publication Date: 2016-10-12
NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to provide a method based on the natural sedimentation mechanism of abrasives for the existing freeze-bonded abrasive polishing pads, which have low removal rate, low precision, and multiple clamping of the polishing disc, resulting in changes in the processing and positioning benchmarks. The prepared layered frozen solidified abrasive polishing pad and its preparation method meet the current requirements of ensuring the polishing quality of workpieces and improving economic benefits

Method used

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  • Layered frozen fixed abrasive polishing pad and preparation method thereof
  • Layered frozen fixed abrasive polishing pad and preparation method thereof
  • Layered frozen fixed abrasive polishing pad and preparation method thereof

Examples

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Effect test

Embodiment 1

[0045] A CMP frozen polishing pad for polishing ultra-thin materials, made of 350 grams of micron SiC (or micron Cr 2 o 3、 SiO 2 、Al2 o 3 , CeO 2 ) abrasive and deionized water with a balance of 650. Stir the two evenly before use, and then mechanically disperse to obtain a colloidal mixture in which the abrasive is dispersed and suspended, and put it into a polishing pad mold. Since the particle size of micron-sized abrasives obeys the normal distribution, such as figure 1 As shown, the settling speed of abrasive particles with large particle size is faster, and the settling speed of abrasive particles with small particle size is slower, so after standing for 7-8 minutes, the suspension will appear obvious stratification, and the abrasive particles will become larger from top to bottom. , wherein the total weight of the nano-scale and micron-scale abrasives is about 35 grams each, and the particle diameters of the remaining 280 grams of abrasives after dispersion are all ...

Embodiment 2

[0047] A CMP frozen polishing pad for ultra-soft material polishing, made of 250 grams of micron SiC (or micron Cr 2 o 3、 SiO 2 、Al 2 o 3 , CeO 2 ) abrasive and deionized water with a balance of 750. Stir the two evenly before use, and then mechanically disperse to obtain a colloidal mixture in which the abrasive is dispersed and suspended, and put it into a polishing pad mold. Since the particle size of micron-sized abrasives obeys the normal distribution, such as figure 1 As shown, the total weight of the nano-scale and micron-scale abrasives is about 12.5 grams each, and the particle diameters of the remaining 225 grams of abrasives after dispersion are all in the submicron order. Abrasive particles settle slowly, so the suspension will be clearly stratified after standing for 7-8 minutes, and the abrasive particles become larger from top to bottom, and the top layer is the deionized water layer. Feed liquid nitrogen into the liquid inlet 2 of the lower mold 1 until t...

Embodiment 3

[0049] A CMP frozen polishing pad for polishing superhard materials, made of 450 grams of micron SiC (or micron Cr 2 o 3、 SiO 2 、Al 2 o 3 , CeO 2 ) abrasive and deionized water with a balance of 550. Mix the two evenly before use, and then mechanically disperse to obtain a colloidal mixture in which the abrasive is dispersed and suspended, and put it into a polishing pad mold. Since the particle size of micron-sized abrasives obeys the normal distribution, such as figure 1 As shown, the settling speed of abrasive particles with large particle size is faster, and the settling speed of abrasive particles with small particle size is slower, so after standing for 7-8 minutes, the suspension will appear obvious stratification, and the abrasive particles will become larger from top to bottom. , wherein the total weight of nano-scale and micron-scale abrasives is about 36 grams each, and the remaining 378 grams of abrasives are dispersed in sub-micron size, and the top layer is ...

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Abstract

The invention provides a layered frozen fixed abrasive polishing pad and a preparation method thereof. The layered frozen fixed abrasive polishing pad is characterized by being prepared through the following steps that firstly, a micron-grade abrasive and deionized water which are proportioned are uniformly stirred and subjected to mechanical dispersion, so that a dispersed and suspended liquid or colloidal to-be-frozen raw material of the abrasive is obtained and placed in a lower mold; secondly, an upper mold is matched with the lower mold, and then polishing liquid is subjected to still standing for 7-8 minutes till obvious concentration layering occurs; thirdly, liquid nitrogen is introduced into a liquid inlet till the polishing liquid is frozen and formed, or the molds are placed into a low-temperature testing box with the temperature being minus 60 DEG C-minus 80 DEG C to be frozen for 2-3 minutes; fourthly, the molds are overall inverted, and hot air is introduced into the liquid inlet for 1-2 minutes, or the hot air is blown to the outer surface layer of the lower mold for 1-2 minutes; and fifthly, the polishing pad preparation molds and the frozen fixed abrasive are separated, so that the polishing pad which is formed by being frozen after being subjected to natural sedimentation and classification and is composed of a micron-grade abrasive layer, a sub-micron grade abrasive layer, a nano-grade abrasive layer and a deionized water layer is prepared. According to the layered frozen fixed abrasive polishing pad and the preparation method thereof, the method is simple, and the polishing pad does not need to be replaced in the using process.

Description

technical field [0001] The invention relates to a new type of fixed abrasive polishing pad and its preparation method, especially a kind of polishing pad with deionized water as a binder, which is bonded with abrasives of different particle sizes that are naturally sedimented and stratified by rapid freezing, and its preparation The method is specifically a layered frozen solidified abrasive polishing pad prepared based on the natural sedimentation mechanism of abrasives and a preparation method thereof. Background technique [0002] As we all know, the traditional CMP (Chemical Mechanical Polishing) system is composed of three parts: a rotating workpiece holding device, a table carrying a polishing pad, and a polishing liquid (slurry) supply system. During polishing, the rotating workpiece is pressed against the polishing pad that rotates with the worktable with a certain pressure, while the polishing liquid composed of submicron or nanometer abrasives and chemical liquid f...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B24D18/00B24D13/02
CPCB24D13/02B24D18/0072
Inventor 孙玉利汤苏扬左敦稳卢文壮王勇徐洋刘志刚刘巍潘天宇
Owner NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
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