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Indium tin oxide film, preparing method thereof, array substrate comprising indium tin oxide film and display device

A technology of indium tin oxide and indium oxide, which is applied in semiconductor/solid-state device manufacturing, instruments, nonlinear optics, etc., can solve the problem that the probability of target re-use is negligible, reduce the service life of magnetron sputtering equipment, and cannot effectively guarantee Equipment loss and other issues, to achieve the effect of improving target utilization, shortening the development cycle, and simple and convenient control methods

Inactive Publication Date: 2016-11-09
BOE TECH GRP CO LTD +1
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

However, if one of the characteristic parameters of the prepared sample is not good and needs to be further adjusted through the composition ratio, the probability of the target being used again is very small, and it almost needs to be discarded, and the oxide powder needs to be re-proportioned. Sintering and grinding to prepare a new target for experiment
The time waste and economic waste caused by this process are difficult to effectively control
At the same time, opening the vacuum sputtering chamber of the equipment many times also reduces the service life of the magnetron sputtering equipment, and cannot effectively guarantee equipment loss

Method used

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  • Indium tin oxide film, preparing method thereof, array substrate comprising indium tin oxide film and display device
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  • Indium tin oxide film, preparing method thereof, array substrate comprising indium tin oxide film and display device

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Embodiment Construction

[0045] In the following, the technical solutions of the present invention will be further described in detail through embodiments and in conjunction with the drawings. In the specification, the same or similar reference numerals indicate the same or similar components. It should be noted that the following drawings are simplified schematic diagrams. The number, shape, and size of the components in the drawings can be changed at will according to actual implementation conditions, and the layout of the components can be more complicated. The present invention can also be implemented or applied through other different specific embodiments, and various details in this specification can also be based on different viewpoints and applications, and various modifications and changes can be made without departing from the spirit of the present invention.

[0046] According to the overall inventive concept of the present invention, a method for preparing an indium tin oxide thin film is pro...

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Abstract

The invention discloses an indium tin oxide film, a preparing method thereof, an array substrate comprising the indium tin oxide film and a display device. The preparing method of the indium tin oxide film comprises the steps that A, an independent indium oxide target and an independent tin target are prepared; and B, in the same deposition cavity, indium oxide particles are generated through the indium oxide target, tin particles are generated through the tin target, and the indium tin oxide film is formed jointly through the indium oxide particles and the tin particles on a base body. According to the preparing method, the independent indium oxide target and the independent tin target are prepared, repeated target preparing is avoided, and the sputtering technology does not need to be started again (for example, a vacuum cavity does not need to be opened again in the midway); compared with a single-target coating manner for preparing targets different in tin content through grinding and sintering in a traditional method, the development period is effectively shortened, the content of tin in the film is controlled more conveniently, and the development cost is saved; and the indium tin oxide film can be applied to preparing of various display devices.

Description

Technical field [0001] The present invention relates to the technical field of display and film deposition, in particular to an indium tin oxide film and a preparation method of the indium tin oxide film, an array substrate containing the indium tin oxide film, and a display device. Background technique [0002] The manufacturing of thin film transistor liquid crystal panels mainly includes three stages: array process, assembly process and module process. The Array Process is to first coat a metal film on a clean glass substrate using sputtering equipment, and then coat a non-conductive layer and a semiconductor layer. The semiconductor layer is mostly a transparent conductive oxide film, of which indium tin oxide is used. (ITO) film is the most widely used. ITO films with different composition ratios have different performance in terms of optical and electrical properties, such as transmittance, carrier mobility, and dislocation density. The preparation of ITO films in existin...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/28C23C14/35C23C14/08H01L27/12H01L21/77
CPCC23C14/086C23C14/28C23C14/352H01L27/1222H01L27/1259C23C14/3414H01L29/7869G02F1/133514C23C14/35H01L29/786H01L27/12C23C14/08
Inventor 张启平孙文波钱叶甲
Owner BOE TECH GRP CO LTD
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