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replaceable nozzle icp generator in plasma chemical etching equipment

A technology for generating device and plasma, which is applied to discharge tubes, electrical components, circuits, etc., to achieve the effects of micro-removal, reduction of heat deposition, and simple structure

Active Publication Date: 2017-11-03
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

After all the assembly is completed, it is necessary to test whether stable plasma can be generated and whether the removal function is suitable. Therefore, the replacement of grinding heads with different diameters in the form of replacing the ICP rectangular tube has considerable limitations in the actual processing process.

Method used

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  • replaceable nozzle icp generator in plasma chemical etching equipment
  • replaceable nozzle icp generator in plasma chemical etching equipment
  • replaceable nozzle icp generator in plasma chemical etching equipment

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Embodiment Construction

[0026] The present invention will be described in detail below with reference to the accompanying drawings and examples.

[0027] as attached figure 1 As shown, the present invention provides a replaceable nozzle ICP generating device in plasma chemical etching equipment, the ICP generating device includes a nozzle 11, a plasma torch 4, and an induction coil 3 sleeved outside the plasma torch , high-voltage Tesla ignition coil 12, shielding cover 13, radio frequency power supply 1 and matching device 2, the radio frequency power supply 1 and matching device 2 cooperate to supply power for the induction coil 3, and the high-voltage Tesla ignition coil 12 is powered by an external power supply, said The shielding cover 13 sets the plasma torch 4 and the induction coil 3 inside; the nozzle 11 is detachably fixedly connected to the front end of the plasma torch 4 in the ICP generating device, and the removal is realized by replacing the nozzle 11 with a different inner diameter. ...

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Abstract

The invention discloses a replaceable nozzle ICP generating device in plasma chemical etching equipment, and belongs to the technical field of precision processing devices for optical curved surface mirror processing. The ICP generating device includes a nozzle, a plasma torch, an induction coil set outside the plasma torch, a high-voltage Tesla ignition coil, a radio frequency power supply and a matcher, the radio frequency power supply and the matcher supply power to the induction coil, and the high voltage Tesla The ignition coil is powered by an external power supply; the nozzle is detachably fixedly connected to the front end of the plasma torch in the ICP generator, and the size of the removal function can be adjusted by replacing nozzles with different inner diameters. By adopting the ICP generating device of the present invention, the removal function of the ideal size can be obtained for the processing of the optical element, and the convergence of the surface shape error of the whole frequency band can be realized.

Description

technical field [0001] The invention relates to a plasma chemical etching device for processing large-diameter complex curved surfaces, in particular to an ICP generating device in the plasma chemical etching device, and belongs to the technical field of optical element processing precision processing devices. Background technique [0002] Aspherical optical components can improve the performance of the optical system and simplify the system structure. More and more optical systems choose to use aspheric optical mirrors. Large-scale telescope construction, automotive and aerospace mass production, microelectronics manufacturing, electronic communications, medical imaging, and various other large-scale scientific projects have an increasing demand for ultra-precision optical components and increasing complexity, resulting in the need for optical processing technology. requirements are also getting higher. [0003] The commonly used aspheric mirror processing method is CCOS (...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01J37/32
CPCH01J37/321
Inventor 王旭薛栋林张学军刘泉郑立功
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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