Method for preparing force response photonic crystal material on basis of nano molding technique
A nano-molding technology and photonic crystal technology, applied in the field of preparation of photonic crystal materials, can solve the problems of difficulty in preparing nano-scale photonic crystals, limited precision of photonic crystals, poor structural controllability, etc. The effect of short preparation cycle and reduced preparation cost
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[0048] Example 1
[0049] The preparation method of the force-responsive photonic crystal material is as follows:
[0050] 1. If figure 1 As shown, the preparation steps of the quartz master template are as follows:
[0051] (1) Pre-design the structural parameters of the photonic crystal according to the actual needs, mainly including: the surface structure is a hexagonally arranged columnar lattice, the lattice period is 200nm, the diameter of the raised column is 100nm, and the height of the raised column is 150nm, The effective area is 20×20mm 2 .
[0052] (2) Take a quartz substrate (size is 25mm×25mm), according to the structural parameters of the above-mentioned photonic crystal, use electron beam lithography to expose the quartz substrate and the photoresist on it for 30s, and obtain a band after developing. There is a photoresist with a design pattern; then, the quartz substrate and the photoresist on it are etched for 20 minutes by reactive ion etching technology...
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